Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 3/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 3/20 | 0.41 |
| ▸ | SRD5A1 | P18405 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.39 |
| ▸ | MEN1 | O00255 | 4/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.39 |
| ▸ | GAA | P10253 | 4/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | CASP1 | P29466 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | XDH | P47989 | 1/20 | 0.38 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | CNR1 | P21554 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL69556 | 0.85 | GABRA1 (0.48) | GABRA1GABRB2SRD5A1KMT2AMEN1 | |
| SCHEMBL431551 | 0.85 | ERN1 (0.52) | GABRA1GABRB2SRD5A1KMT2AMEN1 | |
| SCHEMBL11498447 | 0.85 | GABRA1 (0.39) | GABRA1GABRB2SRD5A1KMT2AMEN1 | |
| SCHEMBL9005840 | 0.85 | XDH (0.40) | GABRA1GABRB2SRD5A1KMT2AMEN1 | |
| SCHEMBL2787047 | 0.82 | ALOX5 (0.44) | GABRA1GABRB2SRD5A1KMT2AMEN1 | |
| SCHEMBL7176794 | 0.82 | HSD17B10 (0.45) | GABRA1GABRB2SRD5A1KMT2AMEN1 | |
| SCHEMBL11029086 | 0.80 | GABRA1 (0.41) | GABRA1GABRB2SRD5A1KMT2AMEN1 | |
| SCHEMBL10482097 | 0.80 | IAPP (0.39) | GABRA1GABRB2KDM4EGAAALDH1A1 | |
| SCHEMBL6306446 | 0.79 | MAPT (0.45) | KMT2AMEN1KDM4EGAAALDH1A1 | |
| SCHEMBL10587406 | 0.79 | GABRA1 (0.53) | GABRA1GABRB2SRD5A1KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112048034-B | Antibacterial acrylic emulsion for water-based pigment and preparation method thereof | 广东恒和永盛集团有限公司 | 2022-11-08 | — | — | CN | claimed |
| CN-112048034-A | Antibacterial acrylic emulsion for water-based pigment and preparation method thereof | 广东恒和永盛实业有限公司 | 2020-12-08 | — | — | CN | claimed |
| EP-0369219-B1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AG (DE) | 1995-01-04 | — | — | EP | claimed |
| US-5114816-A | RADIATION-SENSITIVE COMPOUNDS, RADIATION-SENSITIVE MIXTURE PREPARED THEREWITH AND COPYING MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-05-19 | — | — | US | claimed |
| CN-112048034-B | Antibacterial acrylic emulsion for water-based pigment and preparation method thereof | 广东恒和永盛集团有限公司 | 2022-11-08 | — | — | CN | disclosed |
| CN-112048034-A | Antibacterial acrylic emulsion for water-based pigment and preparation method thereof | 广东恒和永盛实业有限公司 | 2020-12-08 | — | — | CN | disclosed |
| US-RE39635-E1 | Polymerizing a hydrophobic siloxane prepolymer and a silylated hydrophobic monomer and hydrolyzing the resulting polymer polymerization is carried out by using one of heat or ultraviolet light | VANDERLAAN DOUGLAS G | 2007-05-15 | — | — | US | disclosed |
| WO-2003082233-A1 | ALLYL-PHENOL COMPOUNDS IN ANDROGENIC DISORDERS | GHISALBERTI CARLO (BR) | 2003-10-09 | — | — | WO | disclosed |
| US-6129986-A | CONSISTS OF A FLUOROPOLYMER TO WHICH A CYANOETHYLATED ACRYLIC MONOMER IS GRAFTED, AN ALKOXYSILANE COMPOUND HAVING A PRIMARY AMINE GROUP, AN ALCOHOL HAVING 1-4 CARBON ATOMS, AND A FLUORESCENT MATERIAL POWDER | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 2000-10-10 | — | — | US | disclosed |
| EP-0990668-A1 | Optically transparent hydrogels and processes for their production | JOHNSON & JOHNSON VISION PRODUCTS, INC. (US) | 2000-04-05 | — | — | EP | disclosed |
| US-6031059-A | POLYMERIZING A HYDROPHOBIC SILOXANE PREPOPLYMER AND A SILYLATED HYDROPHILIC MONOMER AND HYDROLYZING THE RESULTING POLYMER WHEREIN POLYMERIZING IS CARRIED OUT BY USING ONE OF HEAT POLYMERIZATION, ULTRAVIOLET LIGHT | JOHNSON & JOHNSON VISION PRODUCTS, INC. (US) | 2000-02-29 | — | — | US | disclosed |
| US-6007927-A | FOR PREVENTING UNDESIRABLE DETERIORATION OF DIELECTRIC PROPERTIES AND SHORTENING OF DURABILITY INDUCED BY THE IMPURITY IONS PRESENT IN POWDERY BARIUM TITANATE | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 1999-12-28 | — | — | US | disclosed |
| US-5955539-A | HAVING HIGH DIELECTRIC CONSTANT AND IONIC CONDUCTIVITY; BINDER RESIN FOR ELECTRODES, ELECTROLUMINESCENT DEVICES | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 1999-09-21 | — | — | US | disclosed |
| US-5777038-A | FLUOROPOLYMER; ELECTROLUMINESCENCE | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 1998-07-07 | — | — | US | disclosed |
| US-5529886-A | PHOTOSENSITIVE MIXTURE OF A COMPOUND WHICH ON EXPOSURE TO ACTINIC RADIATION FORMS ACID, AND AN ACID-CLEAVABLE ACRYLATE HOMO OR COPOLYMER | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-06-25 | — | — | US | disclosed |
| EP-0514994-B1 | Liquid compositions based on polyisocyanates and epoxides | ENICHEM SPA (IT) | 1995-09-06 | — | — | EP | disclosed |
| US-5442087-A | Preparing offset printing plates and photoresists | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-08-15 | — | — | US | disclosed |
| US-5288833-A | Thermosetting resin with high softening point | ISTITUTO GUIDO DONEGANI S.P.A. (IT) | 1994-02-22 | — | — | US | disclosed |
| EP-0514994-A1 | Liquid compositions based on polyisocyanates and epoxides | ENICHEM S.p.A. (IT) | 1992-11-25 | — | — | EP | disclosed |
| US-5114816-A | RADIATION-SENSITIVE COMPOUNDS, RADIATION-SENSITIVE MIXTURE PREPARED THEREWITH AND COPYING MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-05-19 | — | — | US | disclosed |