Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.47 |
| ▸ | CES1 | P23141 | 1/20 | 0.47 |
| ▸ | MGLL | Q99685 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.39 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.39 |
| ▸ | NOS2 | P35228 | 1/20 | 0.38 |
| ▸ | CTSK | P43235 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.33 |
| ▸ | GAA | P10253 | 2/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | HSD11B2 | P80365 | 1/20 | 0.32 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5131 | 1.00 | CES2 (0.47) | CES2CES1MGLLHDAC8HDAC6 | |
| SCHEMBL5281 | 1.00 | — | — | |
| SCHEMBL9978895 | 1.00 | CES2 (0.47) | CES2CES1MGLLHDAC8HDAC6 | |
| SCHEMBL269368 | 0.96 | — | — | |
| SCHEMBL4389 | 0.89 | — | — | |
| SCHEMBL5421 | 0.81 | — | — | |
| SCHEMBL673560 | 0.79 | CES2 (0.47) | CES2CES1MGLLHDAC8HDAC6 | |
| SCHEMBL1858120 | 0.79 | CES2 (0.47) | CES2CES1MGLLHDAC8HDAC6 | |
| SCHEMBL6265136 | 0.79 | CES2 (0.47) | CES2CES1MGLLHDAC8HDAC6 | |
| SCHEMBL3870753 | 0.79 | CES2 (0.47) | CES2CES1MGLLHDAC8HDAC6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2785695-B1 | NEW BICYCLIC DIHYDROISOQUINOLINE-1-ONE DERIVATIVES | HOFFMANN LA ROCHE (CH) | 2020-06-17 | — | — | EP | disclosed |
| EP-3653618-A1 | NEW DIHYDROQUINOLINE-2-ONE DERIVATIVES | F. Hoffmann-La Roche AG (CH) | 2020-05-20 | — | — | EP | disclosed |
| EP-2755963-B1 | NEW DIHYDROQUINOLINE-2-ONE DERIVATIVES | HOFFMANN LA ROCHE (CH) | 2019-10-30 | — | — | EP | disclosed |
| EP-2758388-B1 | NEW BICYCLIC DIHYDROQUINOLINE-2-ONE DERIVATIVES | HOFFMANN LA ROCHE (CH) | 2018-02-21 | — | — | EP | disclosed |
| CN-104619705-B | Non- cyclic thienyl amides as the inhibitor of fatty acid binding protein (FABP) 4 and/or 5 | 霍夫曼-拉罗奇有限公司 | 2018-01-02 | — | — | CN | disclosed |
| EP-2838883-B1 | NEW PHENYL-TETRAHYDROISOQUINOLINE DERIVATIVES | HOFFMANN LA ROCHE (CH) | 2017-11-08 | — | — | EP | disclosed |
| US-9809599-B2 | Aryl-quinoline derivatives | HOFFMANN-LA ROCHE INC. (US) | 2017-11-07 | — | — | US | disclosed |
| CN-103958478-B | Bicyclic dihydroisoquinolin-1-one derivatives | 霍夫曼-拉罗奇有限公司 | 2017-08-01 | — | — | CN | disclosed |
| EP-3191459-A1 | FUSED HETEROCYCLIC OR CARBOCYCLIC COMPOUNDS CARRYING A SUBSTITUTED CYCLOALIPHATIC RADICAL AND USE THEREOF FOR TREATING VASOPRESSIN-RELATED DISEASES | AbbVie Deutschland GmbH & Co. KG (DE) | 2017-07-19 | — | — | EP | disclosed |
| CN-104245674-B | Phenyl-tetrahydroisoquinoline derivatives | 霍夫曼-拉罗奇有限公司 | 2017-07-11 | — | — | CN | disclosed |
| EP-1720064-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060223001-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |
| EP-1679314-A1 | SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| EP-0377139-B1 | N-substituted acylamino acid compounds, process for their production and their use | BANYU PHARMA CO LTD (JP) | 1995-07-12 | — | — | EP | disclosed |
| EP-0377139-A1 | N-substituted acylamino acid compounds, process for their production and their use | Banyu Pharmaceutical Co., Ltd. (JP) | 1990-07-11 | — | — | EP | disclosed |