SCHEMBL541823

SCHEMBL541823

N[SiH](N)[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4814339 0.72
Hydrazine SCHEMBL20816132 0.67
SCHEMBL17461690 0.58
SCHEMBL147482 0.55
SCHEMBL25343695 0.55
SCHEMBL2739829 0.50
SCHEMBL8381557 0.50
SCHEMBL5087461 0.50
SCHEMBL3277370 0.50
SCHEMBL144817 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113429908-B Adhesion promoter and BIPV system 隆基乐叶光伏科技有限公司 2023-10-10 CN claimed
CN-113429908-A Adhesion promoter and BIPV system 西安隆基绿能建筑科技有限公司 2021-09-24 CN claimed
EP-1807347-B1 METHOD OF PREPARING HYDROPHOBIC SILICA DIRECTLY FROM AN AQUEOUS COLLOIDAL SILICA DISPERSION CABOT CORP (US) 2014-01-22 EP claimed
US-8062820-B2 Toner composition and method of preparing same CABOT CORPORATION (US) 2011-11-22 US claimed
US-7811540-B2 silylamine treating agent; reacting the surface silanol groups to effectively replace the hydrophilic silanol groups with hydrophobic chemical group; toners CABOT CORPORATION (US) 2010-10-12 US claimed
WO-2007133669-A2 TONER COMPOSITION AND METHOD OF PREPARING SAME CABOT CORPORATION (US) 2007-11-22 WO claimed
US-20070264502-A1 Toner composition and method of preparing same CABOT CORPORATION (US) 2007-11-15 US claimed
EP-1807347-A2 METHOD OF PREPARING HYDROPHOBIC SILICA DIRECTLY FROM AN AQUEOUS COLLOIDAL SILICA DISPERSION CABOT CORPORATION (US) 2007-07-18 EP claimed
US-20060171872-A1 silylamine treating agent; reacting the surface silanol groups to effectively replace the hydrophilic silanol groups with hydrophobic chemical group; toners CABOT CORPORATION (US) 2006-08-03 US claimed
WO-2006045012-A2 METHOD OF PREPARING HYDROPHOBIC SILICA DIRECTLY FROM AN AQUEOUS COLLOIDAL SILICA DISPERSION CABOT CORPORATION (US) 2006-04-27 WO claimed
EP-4257623-B1 PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE MITSUBISHI GAS CHEMICAL CO (JP) 2026-05-27 EP disclosed
CN-113892058-B Photosensitive resin composition and cured film thereof 三菱瓦斯化学株式会社 2024-05-14 CN disclosed
US-20240085789-A1 PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-03-14 US disclosed
US-11885694-B2 Temperature sensor element SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-01-30 US disclosed
US-20240027907-A1 METHOD FOR PRODUCING PATTERNED SUBSTRATE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-01-25 US disclosed
US-6962756-B2 Transparent electrically-conductive film and its use MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2005-11-08 US disclosed
EP-1577348-A1 POLYIMIDE PRECURSOR LIQUID COMPOSITION AND POLYIMIDE COATING FILM I.S.T. Corporation (JP) 2005-09-21 EP disclosed
US-20050037213-A1 Polyimide layer improves thermopress-bonding property, solubility in solvents and heat resistance, and exhibits low dielectric constant; for application to high-frequency printed wiring boards MITSUBISHI GAS CHEMICAL COMPANY INC. (JP) 2005-02-17 US disclosed
US-20040265609-A1 Metal-clad laminate MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-12-30 US disclosed
US-20030104232-A1 Transparent electrically-conductive film and its use MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-05 US disclosed