⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4814339 | 0.72 | — | — | |
| SCHEMBL1934082 | 0.72 | — | — | |
| SCHEMBL7573200 | 0.61 | — | — | |
| SCHEMBL6892 | 0.61 | — | — | |
| SCHEMBL20455819 | 0.61 | — | — | |
| SCHEMBL25343695 | 0.55 | — | — | |
| SCHEMBL1518980 | 0.55 | — | — | |
| SCHEMBL9741299 | 0.55 | — | — | |
| SCHEMBL3912341 | 0.55 | — | — | |
| SCHEMBL2407786 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114455951-B | Organic ceramic precursor and ceramic product | 潮州市华嘉科技有限公司 | 2023-04-28 | — | — | CN | claimed |
| CN-114015059-B | High boron content carborane polymer and synthetic method thereof | 中国科学院宁波材料技术与工程研究所 | 2022-09-13 | — | — | CN | claimed |
| CN-114015059-A | High boron content carborane polymer and synthetic method thereof | 中国科学院宁波材料技术与工程研究所 | 2022-02-08 | — | — | CN | claimed |
| CN-1283000-C | Technology for forming side-wall of flash memory control grid cumulate texture | SHANGHAI HUA HONG GROUP CO LTD (CN) | 2006-11-01 | — | — | CN | claimed |
| CN-1547253-A | Technology for forming side-wall of flash memory control grid cumulate texture | () | 2004-11-17 | — | — | CN | claimed |
| CN-114455951-B | Organic ceramic precursor and ceramic product | 潮州市华嘉科技有限公司 | 2023-04-28 | — | — | CN | disclosed |
| CN-114015059-B | High boron content carborane polymer and synthetic method thereof | 中国科学院宁波材料技术与工程研究所 | 2022-09-13 | — | — | CN | disclosed |
| CN-114455951-A | Organic ceramic precursor and ceramic product | 深圳市科思飞科技有限公司 | 2022-05-10 | — | — | CN | disclosed |
| CN-111704467-B | Organic ceramic precursor and ceramic product | 深圳市科思飞科技有限公司 | 2022-04-29 | — | — | CN | disclosed |
| CN-114015059-A | High boron content carborane polymer and synthetic method thereof | 中国科学院宁波材料技术与工程研究所 | 2022-02-08 | — | — | CN | disclosed |
| EP-3459921-B1 | CERAMIC MATRIX COMPOSITE AND METHOD OF FABRICATING A CERAMIC MATRIX COMPOSITE | RAYTHEON TECH CORP (US) | 2021-11-03 | — | — | EP | disclosed |
| CN-110431204-B | Composition containing bis (aminosilyl) alkylamine compound for depositing silicon-containing film and method for manufacturing silicon-containing film using same | DNF有限公司 | 2021-06-18 | — | — | CN | disclosed |
| CN-1547253-A | Technology for forming side-wall of flash memory control grid cumulate texture | () | 2004-11-17 | — | — | CN | disclosed |
| CN-1527357-A | Strained semiconductor insulating layer-coated substrate and method for manufacturing the same | ̨������·����ɷ�����˾ | 2004-09-08 | — | — | CN | disclosed |
| US-20030030093-A1 | Capacitor forming methods and capacitor constructions | MICRON TECHNOLOGY, INC. | 2003-02-13 | — | — | US | disclosed |
| US-6337416-B2 | Preparation of (polycyclic secondary-amino)dialkoxysilane | UBE INDUSTRIES, LTD. (JP) | 2002-01-08 | — | — | US | disclosed |
| US-20010051723-A1 | Preparation of (polycyclic secondary-amino) dialkoxysilane | UBE INDUSTRIES, LTD. | 2001-12-13 | — | — | US | disclosed |
| US-6080677-A | Method for preventing micromasking in shallow trench isolation process etching | VLSI TECHNOLOGY, INC. (US) | 2000-06-27 | — | — | US | disclosed |
| US-4992299-A | Deposition of silicon nitride films from azidosilane sources | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1991-02-12 | — | — | US | disclosed |
| US-4882448-A | Si,Si'diorganyl-N-alkyl-tetrachloro-disilazanes and a process for their preparation | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-11-21 | — | — | US | disclosed |