Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.47 |
| ▸ | PKM | P14618 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | NFE2L2 | Q16236 | 3/20 | 0.41 |
| ▸ | SLC40A1 | Q9NP59 | 3/20 | 0.40 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
| ▸ | MAOB | P27338 | 1/20 | 0.40 |
| ▸ | LOX | P28300 | 1/20 | 0.40 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | CCR1 | P32246 | 1/20 | 0.37 |
| ▸ | CCR5 | P51681 | 1/20 | 0.37 |
| ▸ | CCR8 | P51685 | 1/20 | 0.37 |
| ▸ | METAP1 | P53582 | 1/20 | 0.37 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6904752 | 1.00 | KDM4E (0.47) | KDM4EPKML3MBTL1NFE2L2SLC40A1 | |
| SCHEMBL4457115 | 0.91 | KDM4E (0.45) | KDM4EPKML3MBTL1NFE2L2SLC40A1 | |
| SCHEMBL3983033 | 0.81 | KDM4E (0.50) | KDM4EPKML3MBTL1NFE2L2SLC40A1 | |
| SCHEMBL6476899 | 0.81 | KDM4E (0.46) | KDM4EPKML3MBTL1NFE2L2SLC40A1 | |
| SCHEMBL30528257 | 0.81 | KDM4E (0.46) | KDM4EPKML3MBTL1NFE2L2SLC40A1 | |
| SCHEMBL24995386 | 0.81 | KDM4E (0.46) | KDM4EPKML3MBTL1NFE2L2SLC40A1 | |
| SCHEMBL25376162 | 0.78 | NFE2L2 (0.45) | KDM4EPKML3MBTL1NFE2L2SLC40A1 | |
| SCHEMBL25377920 | 0.78 | PKM (0.43) | KDM4EPKML3MBTL1NFE2L2SLC40A1 | |
| SCHEMBL1148579 | 0.77 | KDM4E (0.50) | KDM4EPKML3MBTL1NFE2L2SLC40A1 | |
| SCHEMBL4660257 | 0.77 | NFE2L2 (0.32) | KDM4EPKML3MBTL1NFE2L2MAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 441 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11795340-B2 | Compositon sensitive to UV-C radiation and UV-C sterilization or disinfection dosimeter | TERRAGENE S.A. (AR) | 2023-10-24 | — | — | US | claimed |
| EP-3964554-A1 | COMPOSITON SENSITIVE TO UV-C RADIATION AND UV-C STERILIZATION OR DISINFECTION DOSIMETER | Terragene LLC (US) | 2022-03-09 | — | — | EP | claimed |
| EP-2945989-A1 | ANTICORROSION AGENTS FOR TRANSPARENT CONDUCTIVE FILM | Carestream Health, Inc. (US) | 2015-11-25 | — | — | EP | claimed |
| WO-2014113308-A1 | ANTICORROSION AGENTS FOR TRANSPARENT CONDUCTIVE FILM | CARESTREAM HEALTH, INC. (US) | 2014-07-24 | — | — | WO | claimed |
| EP-1262319-B1 | Negative-working photosensitive composition and negative-working photosensitive lithographic printing plate | KODAK POLYCHROME GRAPHICS CO (US) | 2004-07-07 | — | — | EP | claimed |
| EP-1184375-B1 | PROCESS FOR PREPARING TRIBROMOMETHYLSULFONYLPYRIDINE | SUMITOMO SEIKA CHEMICALS (JP) | 2003-10-29 | — | — | EP | claimed |
| US-20020128484-A1 | Process for preparing tribromomethylsulfonylpyridine | FUJISAWA EIJI (JP) | 2002-09-12 | — | — | US | claimed |
| US-6420564-B1 | REACTION OF METHYLTHIOPYRIDINE AND HYPOBROMITE IN WATER AND BASE | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2002-07-16 | — | — | US | claimed |
| EP-1184375-A1 | PROCESS FOR PREPARING TRIBROMOMETHYLSULFONYLPYRIDINE | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2002-03-06 | — | — | EP | claimed |
| CN-119056276-A | Preparation method and application of high-concentration salt lake brine | 浙江永正锂电股份有限公司 | 2024-12-03 | — | — | CN | disclosed |
| US-11935803-B2 | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer and semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-03-19 | — | — | US | disclosed |
| US-11795340-B2 | Compositon sensitive to UV-C radiation and UV-C sterilization or disinfection dosimeter | TERRAGENE S.A. (AR) | 2023-10-24 | — | — | US | disclosed |
| CN-112004845-B | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate, and semiconductor device | 三菱瓦斯化学株式会社 | 2022-05-31 | — | — | CN | disclosed |
| EP-3964554-A1 | COMPOSITON SENSITIVE TO UV-C RADIATION AND UV-C STERILIZATION OR DISINFECTION DOSIMETER | Terragene LLC (US) | 2022-03-09 | — | — | EP | disclosed |
| US-20010018170-A1 | Method for producing grains of aliphatic acid silver salt and thermally processed image recording material | FUJIFILM CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| US-6248512-B1 | ORGANIC SILVER SALT, PHOTOSENSITIVE SILVER HALIDE, BINDER AND NITROGEN ACYCLIC COMPOUND | KONICA CORPORATION (JP) | 2001-06-19 | — | — | US | disclosed |
| WO-2000069825-A1 | PROCESS FOR PREPARING TRIBROMOMETHYLSULFONYLPYRIDINE | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2000-11-23 | — | — | WO | disclosed |
| EP-0994381-A1 | A silver halide light-sensitive material containing a specific dye | KONICA CORPORATION (JP) | 2000-04-19 | — | — | EP | disclosed |
| EP-0950921-A2 | Thermally processable photosensitive material, image forming method and antifoggant | KONICA CORPORATION (JP) | 1999-10-20 | — | — | EP | disclosed |
| EP-0382209-A2 | Photocurable composition | NIPPON PAINT CO., LTD. (JP) | 1990-08-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020128484-A1 | Process for preparing tribromomethylsulfonylpyridine | SKP1, TPMT, TET2 | KDM4E 160/4885PKM 1106/4885L3MBTL1 3657/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.