Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7744513 | 0.95 | EPHX2 (0.37) | EPHX2MEN1KMT2AMAPK1POLB | |
| SCHEMBL5434102 | 0.91 | EPHX2 (0.38) | EPHX2MEN1KMT2AMAPK1POLB | |
| SCHEMBL5433897 | 0.86 | MAPK1 (0.40) | EPHX2MEN1KMT2AMAPK1 | |
| SCHEMBL6922876 | 0.79 | MEN1 (0.39) | EPHX2MEN1KMT2AMAPK1 | |
| SCHEMBL5437873 | 0.77 | CYP17A1 (0.37) | EPHX2MEN1KMT2AMAPK1POLB | |
| SCHEMBL135702 | 0.75 | ALDH1A1 (0.53) | EPHX2MEN1KMT2AMAPK1POLB | |
| SCHEMBL3682434 | 0.74 | CYP3A4 (0.43) | EPHX2MAPK1ALDH1A1 | |
| SCHEMBL6810416 | 0.73 | MEN1 (0.41) | EPHX2MEN1KMT2AMAPK1MAPT | |
| SCHEMBL28172595 | 0.72 | MEN1 (0.43) | EPHX2MEN1KMT2AMAPK1 | |
| SCHEMBL5440940 | 0.72 | ALDH1A1 (0.41) | EPHX2MEN1KMT2AMAPK1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-7005230-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-02-28 | — | — | US | disclosed |
| US-6800419-B2 | FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-20040146802-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-29 | — | — | US | disclosed |
| US-20030203307-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |