SCHEMBL5440489

SCHEMBL5440489

Oc1ccccc1C(Cc1ccccc1)c1ccccc1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.52
TSHR P16473 1/20 0.48
GABRA1 P14867 1/20 0.48
GABRB2 P47870 1/20 0.48
CYP1A2 P05177 1/20 0.45
EPHX1 P07099 1/20 0.44
MAPK1 P28482 1/20 0.43
ALPI P09923 1/20 0.42
PKM P14618 1/20 0.42
PTGS1 P23219 1/20 0.42
XIAP P98170 1/20 0.42
SLC7A5 Q01650 1/20 0.42
TRPA1 O75762 1/20 0.42
SLC6A2 P23975 3/20 0.41
TAAR1 Q96RJ0 2/20 0.41
SLC6A4 P31645 2/20 0.41
SLC6A3 Q01959 2/20 0.41
MAOA P21397 1/20 0.41
SIGMAR1 Q99720 1/20 0.41
CYP2A6 P11509 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29167550 0.86 SLC6A4 (0.52) POLBTSHRGABRA1GABRB2CYP1A2
SCHEMBL18076564 0.86 TSHR (0.46) POLBTSHRGABRA1GABRB2MAPK1
SCHEMBL1838934 0.84 POLB (0.50) POLBTSHRGABRA1GABRB2CYP1A2
SCHEMBL1868728 0.81 TSHR (0.64) POLBTSHRGABRA1GABRB2MAPK1
SCHEMBL6535021 0.81 POLB (0.47) POLBTSHRGABRA1GABRB2CYP1A2
SCHEMBL231791 0.80 HSPA5 (0.50) POLBTSHRGABRA1GABRB2MAPK1
SCHEMBL29611994 0.80 HSPA5 (0.50) POLBTSHRGABRA1GABRB2MAPK1
SCHEMBL18076588 0.78 POLB (0.49) POLBTSHRGABRA1GABRB2BCL2L1
SCHEMBL9838282 0.78 GABRA1 (0.54) POLBTSHRGABRA1GABRB2BCL2L1
SCHEMBL3963673 0.78 GABRA1 (0.54) POLBTSHRGABRA1GABRB2BCL2L1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2621995-A1 ADVANCED EPOXY RESIN COMPOSITIONS Dow Global Technologies LLC (US) 2013-08-07 EP disclosed
WO-2012044458-A1 ADVANCED EPOXY RESIN COMPOSITIONS DOW GLOBAL TECHNOLOGIES LLC (US) 2012-04-05 WO disclosed
US-20070059632-A1 Method of manufacturing a semiconductor device MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2007-03-15 US disclosed
EP-1666970-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-06-07 EP disclosed
EP-0624173-A1 PRECATALYZED CATALYST COMPOSITIONS, PROCESS FOR PREPARING RESINS. DOW CHEMICAL CO (US) 1994-11-17 EP disclosed
WO-1993015126-A1 PRECATALYZED CATALYST COMPOSITIONS, PROCESS FOR PREPARING RESINS THE DOW CHEMICAL COMPANY (US) 1993-08-05 WO disclosed
EP-0481980-A1 COMPOSITIONS FOR PRODUCING POLYMERS OF HIGH REFRACTIVE INDEX PPG INDUSTRIES, INC. (US) 1992-04-29 EP disclosed
US-5064929-A Tough, transparent optical films MOBAY CORPORATION (US) 1991-11-12 US disclosed
WO-1989010915-A1 COMPOSITIONS FOR PRODUCING POLYMERS OF HIGH REFRACTIVE INDEX PPG INDUSTRIES, INC. (US) 1989-11-16 WO disclosed