SCHEMBL547271

SCHEMBL547271

CC(C)(C)c1ccccc1[S+](c1ccccc1)c1ccccc1.O=C(OCCCCCCCCI)C(F)(F)S(=O)(=O)[O-]

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546305 0.91 HTR1A (0.30)
SCHEMBL547113 0.90 TDP1 (0.36) HDAC1HDAC2TDP1
SCHEMBL546340 0.90 TDP1 (0.36) HDAC1HDAC2TDP1
SCHEMBL546455 0.87 TDP1 (0.30) TDP1
SCHEMBL547285 0.85 TDP1 (0.35) TDP1
SCHEMBL547031 0.85 TDP1 (0.33) HDAC1HDAC2TDP1
SCHEMBL546476 0.85 TDP1 (0.33) HDAC1HDAC2TDP1
SCHEMBL547298 0.85 TDP1 (0.33) HDAC1HDAC2TDP1
SCHEMBL546640 0.83 TDP1 (0.33) HDAC1HDAC2TDP1
SCHEMBL546509 0.83 HDAC1 (0.33) HDAC1HDAC2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed