Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26967984 | 0.80 | — | — | |
| SCHEMBL546128 | 0.80 | CYP2C9 (0.61) | CYP2C9 | |
| SCHEMBL15973892 | 0.76 | CYP2C9 (0.64) | CYP2C9 | |
| SCHEMBL9395183 | 0.76 | LMNA (0.36) | CYP2C9 | |
| SCHEMBL9243420 | 0.71 | — | — | |
| SCHEMBL7964314 | 0.68 | LMNA (0.36) | CYP2C9 | |
| SCHEMBL2571064 | 0.67 | CYP2C9 (0.38) | CYP2C9 | |
| SCHEMBL15973517 | 0.67 | CYP2C9 (0.53) | CYP2C9 | |
| SCHEMBL8254998 | 0.65 | ALDH1A1 (0.39) | CYP2C9 | |
| SCHEMBL5383090 | 0.65 | FUCA1 (0.33) | CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102513023-B | Trimeric surfactant and synthetic method thereof | UNIV GUANGDONG TECHNOLOGY | 2014-04-02 | — | — | CN | claimed |
| EP-1693705-B1 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORP (JP) | 2014-01-22 | — | — | EP | claimed |
| CN-102513023-A | Trimeric surfactant and its synthetic method | UNIV GUANGDONG TECHNOLOGY | 2012-06-27 | — | — | CN | claimed |
| US-8206886-B2 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-06-26 | — | — | US | claimed |
| US-8158326-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-17 | — | — | US | claimed |
| EP-1906238-B1 | Photosensitive composition and pattern forming method using the same | FUJIFILM CORP (JP) | 2011-11-09 | — | — | EP | claimed |
| US-7807329-B2 | Photosensitive composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2010-10-05 | — | — | US | claimed |
| EP-1703326-B1 | Photosensitive composition and pattern-forming method using the same | FUJIFILM CORP (JP) | 2010-03-10 | — | — | EP | claimed |
| US-7541131-B2 | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-06-02 | — | — | US | claimed |
| US-20090075202-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND METHOD OF PATTERN FORMATION WITH THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-03-19 | — | — | US | claimed |
| US-7323286-B2 | Photosensitive composition, compound used in the same, and patterning method using the same | FUJIFILM CORPORATION (JP) | 2008-01-29 | — | — | US | claimed |
| US-20060210919-A1 | Photosensitive composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-09-21 | — | — | US | claimed |
| EP-1703326-A2 | Photosensitive composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-20 | — | — | EP | claimed |
| US-20060194147-A1 | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition | FUJI PHOTO FILM CO., LTD. | 2006-08-31 | — | — | US | claimed |
| EP-1693705-A2 | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-23 | — | — | EP | claimed |
| US-20060040203-A1 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2006-02-23 | — | — | US | claimed |
| US-20050266336-A1 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2005-12-01 | — | — | US | claimed |
| EP-1591832-A2 | Photosensitive composition, compound used in the same, and patterning method using the same | Fuji Photo Film Co., Ltd. (JP) | 2005-11-02 | — | — | EP | claimed |
| US-20050238992-A1 | Photosensitive composition, compound used in the same, and patterning method using the same | FUJI PHOTO FILM CO., LTD. | 2005-10-27 | — | — | US | claimed |
| EP-1566692-A1 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-24 | — | — | EP | claimed |