SCHEMBL546559

SCHEMBL546559

O=C(OC1CC2CC1CC2CCl)C(C(F)(F)F)(C(F)(F)F)S(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CHRM3 P20309 2/20 0.31
CHRM2 P08172 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546560 0.79 CHRM2 (0.31) CHRM3CHRM2
SCHEMBL2535136 0.75 CHRM3 (0.31) CHRM3CHRM2
SCHEMBL546526 0.70
SCHEMBL546524 0.69
SCHEMBL547383 0.69 MEN1 (0.32)
SCHEMBL2533641 0.69 GPR119 (0.31)
SCHEMBL546817 0.67 L3MBTL1 (0.32)
SCHEMBL2539889 0.66
SCHEMBL547247 0.66 TDP1 (0.38) CHRM3CHRM2
SCHEMBL547232 0.66 KMT2A (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed