SCHEMBL546560

SCHEMBL546560

O=C(OC1CC2CC1CC2CCl)C(C(F)(F)F)(C(F)(F)F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 1/20 0.31
CHRM3 P20309 1/20 0.31
POLB P06746 1/20 0.30
TSHR P16473 1/20 0.30
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546559 0.79 CHRM3 (0.31) CHRM2CHRM3
SCHEMBL2535138 0.73 HSD11B1 (0.33) CHRM2CHRM3POLBTSHRMAPK1
SCHEMBL546525 0.69 KMT2A (0.34)
SCHEMBL547384 0.68 MAPK1 (0.32) POLBTSHRMAPK1
SCHEMBL2533644 0.67 NR1H2 (0.33)
SCHEMBL546818 0.67 KMT2A (0.33) POLBTSHRMAPK1
SCHEMBL547248 0.65 TDP1 (0.35) POLBTSHRMAPK1
SCHEMBL547233 0.65 KMT2A (0.36) POLBTSHRMAPK1
SCHEMBL547280 0.64 KMT2A (0.35) CHRM2CHRM3POLBTSHRMAPK1
SCHEMBL2539894 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed