Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSL | P07711 | 1/20 | 0.30 |
| ▸ | CTSB | P07858 | 1/20 | 0.30 |
| ▸ | CTSK | P43235 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL73020 | 0.98 | — | — | |
| SCHEMBL8023790 | 0.93 | — | — | |
| SCHEMBL8645580 | 0.88 | — | — | |
| SCHEMBL887736 | 0.83 | CTSL (0.32) | CTSLCTSBCTSK | |
| SCHEMBL18697320 | 0.83 | CTSL (0.32) | CTSLCTSBCTSK | |
| SCHEMBL4672160 | 0.80 | MEN1 (0.30) | CTSLCTSBCTSK | |
| SCHEMBL887669 | 0.79 | CTSL (0.35) | CTSLCTSBCTSK | |
| SCHEMBL8050729 | 0.79 | — | — | |
| SCHEMBL1534105 | 0.78 | CETP (0.35) | — | |
| SCHEMBL887730 | 0.78 | CTSL (0.34) | CTSLCTSBCTSK |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230350296-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-02 | — | — | US | claimed |
| US-20230288801-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-14 | — | — | US | claimed |
| US-20230288804-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-14 | — | — | US | claimed |
| CN-116736633-A | Resist material and pattern forming method | 信越化学工业株式会社 | 2023-09-12 | — | — | CN | claimed |
| US-10509314-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-12-17 | — | — | US | claimed |
| US-10126647-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-11-13 | — | — | US | claimed |
| US-20170108774-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-20 | — | — | US | claimed |
| US-20170075218-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-16 | — | — | US | claimed |
| US-20170075217-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-16 | — | — | US | claimed |
| US-5811475-A | REACTING A CARBON WITH A POLYMER HAVING A REACTIVE GROUP AND A HYDROLYZABLE TERT-ALKYL ACRYLIC ESTER; PRINTING INKS; DIELECTRICS; HIGH ELECTRICAL RESISTANCE | NIPPON OIL CO., LTD. (JP) | 1998-09-22 | — | — | US | claimed |
| EP-0208486-A2 | Process for producing tissue plasminogen activator | Toyo Boseki Kabushiki Kaisha (JP) | 1987-01-14 | — | — | EP | claimed |
| CN-112673715-B | Electronic component and method for manufacturing electronic component | 株式会社力森诺科 | 2025-03-07 | — | — | CN | disclosed |
| CN-119156892-A | Method for manufacturing substrate with conductive via hole and method for manufacturing wiring substrate with conductive via hole | 株式会社力森诺科 | 2024-12-17 | — | — | CN | disclosed |
| CN-119096706-A | Method for manufacturing substrate with conductive through hole, substrate with conductive through hole and metal paste | 株式会社力森诺科 | 2024-12-06 | — | — | CN | disclosed |
| WO-2024204392-A1 | METHOD FOR PRODUCING BIO-DERIVED ESTER COMPOUND, BIO-DERIVED ESTER COMPOUND PRODUCED THEREBY, COSMETIC OR DETERGENT CONTAINING BIO-DERIVED ESTER COMPOUND, AND METHOD FOR REDUCING ODOR OF ESTER COMPOUND | 株式会社ADEKA | 2024-10-03 | — | — | WO | disclosed |
| EP-1308782-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-05-07 | — | — | EP | disclosed |
| US-5821277-A | Thermosetting and procuring compositions for color filters and method for making the same | NIPPON OIL CO., LTD. (JP) | 1998-10-13 | — | — | US | disclosed |
| US-5811475-A | REACTING A CARBON WITH A POLYMER HAVING A REACTIVE GROUP AND A HYDROLYZABLE TERT-ALKYL ACRYLIC ESTER; PRINTING INKS; DIELECTRICS; HIGH ELECTRICAL RESISTANCE | NIPPON OIL CO., LTD. (JP) | 1998-09-22 | — | — | US | disclosed |
| EP-0753548-A2 | Method for producing carbonaceous material | NIPPON OIL COMPANY, LIMITED (JP) | 1997-01-15 | — | — | EP | disclosed |
| CN-87107785-A | OXADIAZOLE-ALKYL-PURINE DERIVATIVES | — | 1988-07-20 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10509314-B2 | Resist composition and patterning process | SRMS, SLC11A2, PCNA | CTSL 4736/4885CTSB 4687/4885CTSK 4594/4885 |
| US-10126647-B2 | Resist composition and patterning process | SLC11A2, PSPH, PARG | CTSL 3928/4885CTSB 4008/4885CTSK 3901/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.