SCHEMBL547110

SCHEMBL547110

O=C(OCCCCCCCCCCCCCCCCCCCCBr)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1cccc(F)c1

nearest known ligand 0.35

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KAT6A Q92794 4/20 0.34
GAA P10253 1/20 0.34
TAS2R14 Q9NYV8 2/20 0.33
ABCC9 O60706 1/20 0.32
ABCC8 Q09428 1/20 0.32
KCNJ11 Q14654 1/20 0.32
KCNJ8 Q15842 1/20 0.32
TDP1 Q9NUW8 2/20 0.32
USP2 O75604 1/20 0.32
BCHE P06276 2/20 0.32
ALDH1A1 P00352 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
MAPT P10636 1/20 0.31
PGR P06401 1/20 0.31
PTGDR Q13258 1/20 0.31
PTGDR2 Q9Y5Y4 1/20 0.31
GBA1 P04062 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546499 0.92 KAT6A (0.34) KAT6AGAATAS2R14ABCC9ABCC8
SCHEMBL546302 0.92 TDP1 (0.37) GAATDP1MEN1KMT2AMAPT
SCHEMBL2183099 0.92 TDP1 (0.37) GAATDP1MEN1KMT2AMAPT
SCHEMBL546871 0.92 TDP1 (0.37) GAATDP1MEN1KMT2AMAPT
SCHEMBL547444 0.92 TDP1 (0.37) GAATDP1MEN1KMT2AMAPT
SCHEMBL546331 0.92 TDP1 (0.37) GAATDP1MEN1KMT2AMAPT
SCHEMBL546827 0.92 TDP1 (0.37) GAATDP1MEN1KMT2AMAPT
SCHEMBL546351 0.91 HSD11B1 (0.36) GAATAS2R14TDP1ALDH1A1MEN1
SCHEMBL546323 0.91 HSD11B1 (0.36) GAATAS2R14TDP1ALDH1A1MEN1
SCHEMBL546755 0.91 HSD11B1 (0.36) GAATAS2R14TDP1ALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed