SCHEMBL546499

SCHEMBL546499

O=C(OCCBr)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1cccc(F)c1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KAT6A Q92794 4/20 0.34
ABCC9 O60706 1/20 0.34
ABCC8 Q09428 1/20 0.34
KCNJ11 Q14654 1/20 0.34
KCNJ8 Q15842 1/20 0.34
GAA P10253 1/20 0.34
PGR P06401 1/20 0.33
TAS2R14 Q9NYV8 2/20 0.33
PTGDR Q13258 1/20 0.33
PTGDR2 Q9Y5Y4 1/20 0.33
GBA1 P04062 1/20 0.33
PKM P14618 1/20 0.32
TSHR P16473 1/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
USP2 O75604 1/20 0.32
POLB P06746 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
ALDH1A1 P00352 1/20 0.32
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547110 0.92 KAT6A (0.34) KAT6AABCC9ABCC8KCNJ11KCNJ8
SCHEMBL547387 0.91 KMT2A (0.36) GAATSHRMEN1KMT2APOLB
SCHEMBL546827 0.81 TDP1 (0.37) GAATSHRMEN1KMT2APOLB
SCHEMBL546331 0.81 TDP1 (0.37) GAATSHRMEN1KMT2APOLB
SCHEMBL547444 0.81 TDP1 (0.37) GAATSHRMEN1KMT2APOLB
SCHEMBL546302 0.81 TDP1 (0.37) GAATSHRMEN1KMT2APOLB
SCHEMBL546871 0.81 TDP1 (0.37) GAATSHRMEN1KMT2APOLB
SCHEMBL2183099 0.81 TDP1 (0.37) GAATSHRMEN1KMT2APOLB
SCHEMBL546323 0.81 HSD11B1 (0.36) GAATAS2R14MEN1KMT2APOLB
SCHEMBL546351 0.81 HSD11B1 (0.36) GAATAS2R14MEN1KMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed