SCHEMBL547212

SCHEMBL547212

O=C(OCCl)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccc(F)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 5/20 0.38
EGFR P00533 1/20 0.36
ERBB2 P04626 1/20 0.36
PKM P14618 1/20 0.35
ALDH1A1 P00352 1/20 0.34
TAS2R14 Q9NYV8 2/20 0.34
MMP1 P03956 1/20 0.34
MMP2 P08253 1/20 0.34
MMP3 P08254 1/20 0.34
MMP9 P14780 1/20 0.34
MMP12 P39900 1/20 0.34
MMP13 P45452 1/20 0.34
MMP14 P50281 1/20 0.34
KEAP1 Q14145 1/20 0.34
NFE2L2 Q16236 1/20 0.34
NOD2 Q9HC29 1/20 0.34
NOD1 Q9Y239 1/20 0.34
KMT2A Q03164 3/20 0.33
MEN1 O00255 2/20 0.33
MAPK1 P28482 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547233 0.94 KMT2A (0.36) HSD11B1ALDH1A1KMT2AMEN1MAPK1
SCHEMBL546389 0.87 HSD11B1 (0.34) HSD11B1EGFRERBB2PKMALDH1A1
SCHEMBL546522 0.86 CA12 (0.34) HSD11B1EGFRERBB2ALDH1A1KMT2A
SCHEMBL546845 0.86 CA12 (0.34) HSD11B1EGFRERBB2ALDH1A1KMT2A
SCHEMBL547331 0.86 CA12 (0.34) HSD11B1EGFRERBB2ALDH1A1KMT2A
SCHEMBL547274 0.82 HSD11B1 (0.34) HSD11B1EGFRERBB2PKMALDH1A1
SCHEMBL546477 0.82 HSD11B1 (0.34) HSD11B1EGFRERBB2PKMALDH1A1
SCHEMBL546323 0.82 HSD11B1 (0.36) HSD11B1EGFRERBB2ALDH1A1TAS2R14
SCHEMBL546755 0.82 HSD11B1 (0.36) HSD11B1EGFRERBB2ALDH1A1TAS2R14
SCHEMBL546351 0.82 HSD11B1 (0.36) HSD11B1EGFRERBB2ALDH1A1TAS2R14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed