SCHEMBL547274

SCHEMBL547274

O=C(OCCCCCF)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccc(F)cc1)c1ccc(F)cc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.34
CA12 O43570 2/20 0.34
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
CA9 Q16790 2/20 0.34
FKBP1A P62942 1/20 0.34
EGFR P00533 1/20 0.33
ERBB2 P04626 1/20 0.33
ALDH1A1 P00352 1/20 0.32
HDAC1 Q13547 1/20 0.32
HDAC2 Q92769 1/20 0.32
PKM P14618 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
TAS2R14 Q9NYV8 2/20 0.31
MMP1 P03956 1/20 0.31
MMP2 P08253 1/20 0.31
MMP3 P08254 1/20 0.31
MMP9 P14780 1/20 0.31
MMP12 P39900 1/20 0.31
MMP13 P45452 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547270 0.94 CA12 (0.35) CA12CA1CA2CA9HDAC1
SCHEMBL546522 0.90 CA12 (0.34) HSD11B1CA12CA1CA2CA9
SCHEMBL546858 0.90 HSD11B1 (0.36) HSD11B1CA12CA1CA2CA9
SCHEMBL547409 0.90 HSD11B1 (0.36) HSD11B1CA12CA1CA2CA9
SCHEMBL546477 0.90 HSD11B1 (0.34) HSD11B1CA12CA1CA2CA9
SCHEMBL547299 0.90 HSD11B1 (0.34) HSD11B1CA12CA1CA2CA9
SCHEMBL546351 0.90 HSD11B1 (0.36) HSD11B1CA12CA1CA2CA9
SCHEMBL546755 0.90 HSD11B1 (0.36) HSD11B1CA12CA1CA2CA9
SCHEMBL547331 0.90 CA12 (0.34) HSD11B1CA12CA1CA2CA9
SCHEMBL546323 0.90 HSD11B1 (0.36) HSD11B1CA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed