Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.49 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | NAAA | Q02083 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1348804 | 0.88 | TSHR (0.40) | TSHRNPSR1 | |
| SCHEMBL2193633 | 0.80 | TSHR (0.43) | TSHRNPSR1EPHX2 | |
| SCHEMBL1697272 | 0.77 | TSHR (0.56) | TSHRNPSR1EPHX2NAAA | |
| SCHEMBL12705217 | 0.74 | TSHR (0.53) | TSHRNPSR1EPHX2NAAA | |
| SCHEMBL14019740 | 0.73 | TSHR (0.63) | TSHRNPSR1EPHX2NAAA | |
| SCHEMBL19261603 | 0.73 | TSHR (0.52) | TSHRNPSR1EPHX2CA2NAAA | |
| SCHEMBL547287 | 0.73 | TSHR (0.52) | TSHRNPSR1EPHX2CA2NAAA | |
| SCHEMBL10203472 | 0.73 | TSHR (0.49) | TSHRNPSR1EPHX2CA2NAAA | |
| SCHEMBL10150821 | 0.72 | TSHR (0.51) | TSHRNPSR1EPHX2CA2NAAA | |
| SCHEMBL10150481 | 0.71 | NPSR1 (0.53) | TSHRNPSR1EPHX2NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9122155-B2 | Sulfonium salt, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| EP-2146247-B1 | Resist patterning process and manufacturing photo mask | SHINETSU CHEMICAL CO (JP) | 2015-04-15 | — | — | EP | disclosed |
| US-8956803-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-8110335-B2 | Resist patterning process and manufacturing photo mask | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-07 | — | — | US | disclosed |
| EP-2146247-A1 | Resist patterning process and manufacturing photo mask | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |
| US-20100009271-A1 | Resist patterning process and manufacturing photo mask | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2010-01-14 | — | — | US | disclosed |