Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547288 | 0.88 | TSHR (0.49) | TSHRNPSR1 | |
| SCHEMBL3692935 | 0.85 | TSHR (0.42) | TSHRNPSR1 | |
| SCHEMBL3692938 | 0.83 | TSHR (0.40) | TSHRNPSR1 | |
| SCHEMBL546868 | 0.78 | TSHR (0.41) | TSHRNPSR1 | |
| SCHEMBL977611 | 0.75 | P2RX7 (0.36) | — | |
| SCHEMBL12932571 | 0.72 | TSHR (0.46) | TSHRNPSR1 | |
| SCHEMBL547017 | 0.71 | BCAT1 (0.36) | TSHR | |
| SCHEMBL2193633 | 0.70 | TSHR (0.43) | TSHRNPSR1 | |
| SCHEMBL3024911 | 0.70 | LMNA (0.31) | — | |
| SCHEMBL98285 | 0.69 | NPSR1 (0.43) | TSHRNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8062829-B2 | Chemically amplified resist composition and chemically amplified resist composition for immersion lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-22 | — | — | US | disclosed |
| US-20110189618-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20110171586-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20100279226-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-11-04 | — | — | US | disclosed |
| US-20100230136-A1 | METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20090220890-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND CHEMICALLY AMPLIFIED RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |