SCHEMBL547387

SCHEMBL547387

O=C(OCCBr)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.36
MEN1 O00255 3/20 0.36
POLB P06746 3/20 0.36
HTT P42858 2/20 0.34
TSHR P16473 2/20 0.34
MAPK1 P28482 2/20 0.34
CHRM2 P08172 3/20 0.34
CHRM1 P11229 3/20 0.34
CHRM3 P20309 3/20 0.34
HSD17B10 Q99714 2/20 0.34
MAPT P10636 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
HSD11B1 P28845 2/20 0.33
ALDH1A1 P00352 1/20 0.33
KDM4E B2RXH2 1/20 0.32
NR1I2 O75469 1/20 0.32
LMNA P02545 1/20 0.32
CYP1A1 P04798 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP2E1 P05181 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546499 0.91 KAT6A (0.34) KMT2AMEN1POLBTSHRCHRM2
SCHEMBL2183099 0.90 TDP1 (0.37) KMT2AMEN1POLBHTTTSHR
SCHEMBL546871 0.90 TDP1 (0.37) KMT2AMEN1POLBHTTTSHR
SCHEMBL546331 0.90 TDP1 (0.37) KMT2AMEN1POLBHTTTSHR
SCHEMBL547444 0.90 TDP1 (0.37) KMT2AMEN1POLBHTTTSHR
SCHEMBL546827 0.90 TDP1 (0.37) KMT2AMEN1POLBHTTTSHR
SCHEMBL546302 0.90 TDP1 (0.37) KMT2AMEN1POLBHTTTSHR
SCHEMBL546351 0.85 HSD11B1 (0.36) KMT2AMEN1POLBHSD11B1ALDH1A1
SCHEMBL546858 0.85 HSD11B1 (0.36) KMT2AMEN1POLBHSD11B1ALDH1A1
SCHEMBL546323 0.85 HSD11B1 (0.36) KMT2AMEN1POLBHSD11B1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed