Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 3/20 | 0.66 |
| ▸ | PAM | P19021 | 1/20 | 0.48 |
| ▸ | GRIK1 | P39086 | 2/20 | 0.47 |
| ▸ | GRIK2 | Q13002 | 2/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | IDO1 | P14902 | 2/20 | 0.44 |
| ▸ | AHR | P35869 | 1/20 | 0.43 |
| ▸ | CTSC | P53634 | 1/20 | 0.41 |
| ▸ | CNR2 | P34972 | 1/20 | 0.41 |
| ▸ | MAOB | P27338 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19604562 | 1.00 | HTR2A (0.66) | HTR2APAMGRIK1GRIK2TSHR | |
| SCHEMBL5475689 | 1.00 | HTR2A (0.66) | HTR2APAMGRIK1GRIK2TSHR | |
| SCHEMBL21189126 | 1.00 | HTR2A (0.66) | HTR2APAMGRIK1GRIK2TSHR | |
| SCHEMBL2170349 | 0.83 | HTR2A (0.70) | HTR2APAMGRIK1GRIK2IDO1 | |
| SCHEMBL4029905 | 0.83 | HTR2A (0.59) | HTR2APAMGRIK1GRIK2IDO1 | |
| SCHEMBL107851 | 0.83 | HTR2A (0.70) | HTR2APAMGRIK1GRIK2IDO1 | |
| SCHEMBL14037582 | 0.83 | HTR2A (0.70) | HTR2APAMGRIK1GRIK2IDO1 | |
| SCHEMBL107852 | 0.83 | HTR2A (0.70) | HTR2APAMGRIK1GRIK2IDO1 | |
| SCHEMBL7903419 | 0.83 | HTR2A (0.59) | HTR2APAMGRIK1GRIK2IDO1 | |
| SCHEMBL25189137 | 0.80 | HTR2A (0.61) | HTR2APAMGRIK1GRIK2IDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0787750-B1 | Poly(alkylethylene) structural isomers | BOREALIS GMBH (AT) | 2003-05-14 | — | — | EP | claimed |
| US-4680358-A | Styryl terminated macromolecular monomers of polyethers | THE B F GOODRICH COMPANY (US) | 1987-07-14 | — | — | US | claimed |
| EP-0221551-A2 | Styryl terminated macromolecular monomers of polyethers | The B.F. GOODRICH Company (US) | 1987-05-13 | — | — | EP | claimed |
| EP-4749365-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-05-27 | — | — | EP | disclosed |
| CN-122072437-A | Chemically amplified negative resist composition and resist pattern forming method | 信越化学工业株式会社 | 2026-05-22 | — | — | CN | disclosed |
| US-20260063998-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-05 | — | — | US | disclosed |
| EP-4703798-A2 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-03-04 | — | — | EP | disclosed |
| EP-4703797-A2 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-03-04 | — | — | EP | disclosed |
| US-20260050216-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-19 | — | — | US | disclosed |
| US-20260010074-A1 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-4675353-A1 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| EP-1721912-A1 | PROCESS FOR PRODUCING POLYMER WITH FUNCTIONAL END | KURARAY CO., LTD. (JP) | 2006-11-15 | — | — | EP | disclosed |
| EP-0787750-B1 | Poly(alkylethylene) structural isomers | BOREALIS GMBH (AT) | 2003-05-14 | — | — | EP | disclosed |
| US-6388020-B2 | MODIFIED WITH LESS THAN 5% BY WEIGHT OF MONOFUNCTIONAL, DIFUNCTIONAL AND POLYFUNCTIONAL MONOMERS; IMPROVED MELT PROCESSABILITY; SHEETS, FILMS, PANELS, COATINGS, PIPES, HOLLOW OBJECTS AND FOAMS | BOREALIS GMBH (AT) | 2002-05-14 | — | — | US | disclosed |
| US-20010016628-A1 | Modified with less than 5% by weight of monofunctional, difunctional and polyfunctional monomers; improved melt processability; sheets, films, panels, coatings, pipes, hollow objects and foams | BOREALIS GMBH (AU) | 2001-08-23 | — | — | US | disclosed |
| EP-0787750-A2 | Poly(alkylethylene) structural isomers | PCD-Polymere Gesellschaft m.b.H. (AT) | 1997-08-06 | — | — | EP | disclosed |
| US-4680358-A | Styryl terminated macromolecular monomers of polyethers | THE B F GOODRICH COMPANY (US) | 1987-07-14 | — | — | US | disclosed |
| EP-0221551-A2 | Styryl terminated macromolecular monomers of polyethers | The B.F. GOODRICH Company (US) | 1987-05-13 | — | — | EP | disclosed |
| CN-85107235-A | As the replacement cinnamyl-2 of anti-inflammatory agent, the manufacture method of 3-Dihydrobenzofuranes and analogue | — | 1987-04-01 | — | — | CN | disclosed |
| US-3953494-A | FORMING ACIDS AND ESTERS | SOUTHERN ILLINOIS UNIVERSITY FOUNDATION (US) | 1976-04-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260050216-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | NAF1, CHRM1, ARCN1 | HTR2A 4045/4885PAM 2545/4885GRIK1 299/4885 |
| US-20260063998-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | MTX1, CHRM1, POLQ | HTR2A 3207/4885PAM 1058/4885GRIK1 300/4885 |
| US-20260010074-A1 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | NAF1, ASIC1, GRIN1 | HTR2A 2024/4885PAM 2807/4885GRIK1 161/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.