Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28245592 | 0.80 | TDP1 (0.34) | MEN1KMT2A | |
| SCHEMBL5654311 | 0.76 | MEN1 (0.34) | MEN1MAPTMAPK1KMT2A | |
| SCHEMBL28685332 | 0.76 | MEN1 (0.35) | MEN1MAPTMAPK1KMT2A | |
| SCHEMBL8770837 | 0.74 | MEN1 (0.30) | MEN1MAPTMAPK1KMT2A | |
| SCHEMBL4552783 | 0.73 | MEN1 (0.31) | MEN1MAPTMAPK1KMT2A | |
| SCHEMBL6741677 | 0.69 | KDM4E (0.42) | — | |
| SCHEMBL6741675 | 0.69 | KDM4E (0.42) | — | |
| SCHEMBL9422190 | 0.68 | KDM4E (0.31) | — | |
| SCHEMBL9422188 | 0.68 | KDM4E (0.31) | — | |
| SCHEMBL27389792 | 0.67 | ALDH1A1 (0.45) | MAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2009070574-A2 | METHODS FOR MODIFICATION OF POLYMERS, FIBERS AND TEXTILE MEDIA | NORTH CAROLINA STATE UNIVERSITY (US) | 2009-06-04 | — | — | WO | claimed |
| US-20090137043-A1 | METHODS FOR MODIFICATION OF POLYMERS, FIBERS AND TEXTILE MEDIA | NORTH CAROLINA STATE UNIVERSITY | 2009-05-28 | — | — | US | claimed |
| CN-116194843-A | Low upper temperature homopolymers as sacrificial protective layers for environmentally sensitive substrates | 朗姆研究公司 | 2023-05-30 | — | — | CN | disclosed |
| CN-107848926-B | Novolac type phenolic hydroxyl group-containing resin and resist film | DIC株式会社 | 2021-04-20 | — | — | CN | disclosed |
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | disclosed |
| EP-2080750-B1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| US-9897913-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-20 | — | — | US | disclosed |
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | disclosed |
| US-20150030980-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-01-29 | — | — | US | disclosed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-8846292-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-09-30 | — | — | US | disclosed |
| WO-2009027971-A2 | ANTIMICROBIAL POLYMERS | H2Q WATER INDUSTRIES LTD. (IL) | 2009-03-05 | — | — | WO | disclosed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
| CN-1247574-C | Isoindolin-1-one glucokinase activators | HOFFMANN LA ROCHE (CH) | 2006-03-29 | — | — | CN | disclosed |
| CN-1481382-A | Isoindolin-1-one glucokinase activators | - | 2004-03-10 | — | — | CN | disclosed |
| EP-1349856-A2 | ISOINDOLIN-1-ONE GLUCOKINASE ACTIVATORS | F. HOFFMANN-LA ROCHE AG (CH) | 2003-10-08 | — | — | EP | disclosed |
| WO-2002048106-A2 | ISOINDOLIN-1-ONE GLUCOKINASE ACTIVATORS | F. HOFFMANN-LA-ROCHE AG (CH) | 2002-06-20 | — | — | WO | disclosed |
| US-5985513-A | POLYSILANES AND BENZOPHENONES | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-11-16 | — | — | US | disclosed |
| US-5962581-A | POLYSILANE; IRRADIATING WITH ACTINIC RADIATION; REMOVAL SEGMENTS BY DISSOLVING IN AQUEOUS ALKALINE DEVELOPER | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-10-05 | — | — | US | disclosed |