Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 6/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.52 |
| ▸ | BAX | Q07812 | 1/20 | 0.52 |
| ▸ | CA1 | P00915 | 1/20 | 0.47 |
| ▸ | CA2 | P00918 | 1/20 | 0.47 |
| ▸ | MAOA | P21397 | 1/20 | 0.46 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.46 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.46 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.46 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.46 |
| ▸ | NPC1 | O15118 | 3/20 | 0.46 |
| ▸ | RAB9A | P51151 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.45 |
| ▸ | MAPT | P10636 | 2/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547582 | 0.91 | RAB9A (0.52) | LTA4HTSHRNR1H2BAXNPC1 | |
| SCHEMBL548388 | 0.84 | NPC1 (0.47) | NR1H2NPC1RAB9AALDH1A1MEN1 | |
| Diphenylether SCHEMBL27727076 | 0.84 | LTA4H (0.67) | LTA4HTSHRNR1H2BAXCA1 | |
| SCHEMBL548698 | 0.83 | LTA4H (0.48) | LTA4HTSHRNR1H2BAXCA1 | |
| SCHEMBL18383085 | 0.83 | LTA4H (0.56) | LTA4HCA1CA2NPC1RAB9A | |
| SCHEMBL8045052 | 0.83 | TEAD4 (0.50) | TSHRNPC1RAB9AALDH1A1MEN1 | |
| SCHEMBL10038560 | 0.82 | LTA4H (0.57) | LTA4HTSHRNR1H2BAXCA1 | |
| SCHEMBL19392583 | 0.82 | RAB9A (0.65) | LTA4HTSHRNR1H2BAXCA1 | |
| SCHEMBL799841 | 0.82 | RAB9A (0.65) | LTA4HTSHRNR1H2BAXCA1 | |
| SCHEMBL2463038 | 0.82 | LTA4H (0.57) | LTA4HTSHRNR1H2BAXCA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116354801-A | Synthesis method for pyriproxyfen intermediate | 如东众意化工有限公司 | 2023-06-30 | — | — | CN | claimed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| CN-116354801-A | Synthesis method for pyriproxyfen intermediate | 如东众意化工有限公司 | 2023-06-30 | — | — | CN | disclosed |
| CN-116354801-A | Synthesis method for pyriproxyfen intermediate | 如东众意化工有限公司 | 2023-06-30 | — | — | CN | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-20230021574-A1 | METHOD FOR PRODUCING ISOCYANATE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-01-26 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| WO-2021100131-A1 | METHOD FOR PRODUCING ISOCYANATE | 旭化成株式会社 | 2021-05-27 | — | — | WO | disclosed |
| EP-3141957-B1 | RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-24 | — | — | EP | disclosed |
| EP-3279728-B1 | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-17 | — | — | EP | disclosed |
| US-7871751-B2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-02-25 | — | — | US | disclosed |
| EP-2080750-A1 | RADIATION-SENSITIVE COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-20080153031-A1 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-06-26 | — | — | US | disclosed |
| US-7323284-B2 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2008-01-29 | — | — | US | disclosed |
| EP-1739485-A1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-01-03 | — | — | EP | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| US-5032667-A | Heat resistant, waterproof | AMOCO CORPORATION (US) | 1991-07-16 | — | — | US | disclosed |
| US-4925916-A | FROM DIAMINES OR TETRACARBOXY ACIDS CONTAINING AROMATIC RINGS BRIDGED BY ISOALKYLIDENE GROUPS | AMOCO CORPORATION (US) | 1990-05-15 | — | — | US | disclosed |
| US-4713438-A | Amide and/or imide containing polymers and monomers for the preparation thereof | AMOCO CORPORATION (US) | 1987-12-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | LTA4H 186/4885TSHR 2912/4885NR1H2 670/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | LTA4H 355/4885TSHR 1292/4885NR1H2 264/4885 |
| US-20230021574-A1 | METHOD FOR PRODUCING ISOCYANATE | CPS1, IDH3A, ALKBH3 | LTA4H 1793/4885TSHR 4433/4885NR1H2 4211/4885 |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | C1S, C9, RAD51 | LTA4H 3432/4885TSHR 3709/4885NR1H2 1335/4885 |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | LTA4H 355/4885TSHR 1292/4885NR1H2 264/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.