Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 7/20 | 1.00 |
| ▸ | MAOB | P27338 | 5/20 | 1.00 |
| ▸ | MAOA | P21397 | 4/20 | 1.00 |
| ▸ | RAB9A | P51151 | 4/20 | 1.00 |
| ▸ | POLB | P06746 | 1/20 | 1.00 |
| ▸ | F3 | P13726 | 3/20 | 0.82 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.72 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.72 |
| ▸ | CYP1B1 | Q16678 | 2/20 | 0.72 |
| ▸ | HPGD | P15428 | 1/20 | 0.72 |
| ▸ | ESR1 | P03372 | 1/20 | 0.70 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.70 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.70 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.69 |
| ▸ | MEN1 | O00255 | 3/20 | 0.69 |
| ▸ | HSPD1 | P10809 | 2/20 | 0.69 |
| ▸ | HSPE1 | P61604 | 2/20 | 0.69 |
| ▸ | PKM | P14618 | 1/20 | 0.69 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.69 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.69 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8965062 | 1.00 | MAPT (1.00) | MAPTMAOBMAOARAB9APOLB | |
| SCHEMBL548040 | 1.00 | MAPT (1.00) | MAPTMAOBMAOARAB9APOLB | |
| SCHEMBL8965069 | 1.00 | MAPT (1.00) | MAPTMAOBMAOARAB9APOLB | |
| 4,4'-Dimethylchalcone SCHEMBL979560 | 0.93 | MAPT (1.00) | MAPTMAOBMAOARAB9APOLB | |
| 4,4'-Dimethylchalcone SCHEMBL979559 | 0.93 | MAPT (1.00) | MAPTMAOBMAOARAB9APOLB | |
| SCHEMBL25236411 | 0.91 | F3 (1.00) | MAPTMAOBMAOARAB9APOLB | |
| SCHEMBL25223420 | 0.91 | F3 (1.00) | MAPTMAOBMAOARAB9APOLB | |
| SCHEMBL25211913 | 0.91 | F3 (1.00) | MAPTMAOBMAOARAB9APOLB | |
| 4,4'-Dihydroxychalcone SCHEMBL773588 | 0.91 | F3 (1.00) | MAPTMAOBMAOARAB9APOLB | |
| 4,4'-Dihydroxychalcone SCHEMBL25202156 | 0.91 | F3 (1.00) | MAPTMAOBMAOARAB9APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 315 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0428398-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-04-03 | — | — | EP | claimed |
| US-5110706-A | Photoresists for highly reflective substrates | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-05-05 | — | — | US | claimed |
| EP-0428398-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-22 | — | — | EP | claimed |
| US-20260014100-A1 | Compositions and Methods for Treating Bleeding and Bleeding Disorders | YEWSAVIN INC (US) | 2026-01-15 | — | — | US | disclosed |
| US-12343317-B2 | Compositions and methods for treating bleeding and bleeding disorders | YewSavin, Inc. (US) | 2025-07-01 | — | — | US | disclosed |
| WO-2025084342-A1 | IODINE-CONTAINING (METH)ACRYLATE COMPOUND, IODINE-CONTAINING (METH)ACRYLATE (CO)POLYMER, LITHOGRAPHY COMPOSITION, RESIST COMPOSITION, UNDERLAYER-FILM-FORMING COMPOSITION, AND METHOD FOR PRODUCING IODINE-CONTAINING (METH)ACRYLATE COMPOUND | 三菱瓦斯化学株式会社 | 2025-04-24 | — | — | WO | disclosed |
| WO-2025084340-A1 | IODINE-CONTAINING (METH)ACRYLATE COMPOUND, IODINE-CONTAINING (METH)ACRYLATE (CO)POLYMER, LITHOGRAPHY COMPOSITION, RESIST COMPOSITION, BOTTOM LAYER-FORMING COMPOSITION, AND METHOD FOR PRODUCING IODINE-CONTAINING (METH)ACRYLATE COMPOUND | 三菱瓦斯化学株式会社 | 2025-04-24 | — | — | WO | disclosed |
| WO-2025084341-A1 | IODINE-CONTAINING (METH)ACRYLATE COMPOUND, IODINE-CONTAINING (METH)ACRYLATE (CO)POLYMER, LITHOGRAPHY COMPOSITION, RESIST COMPOSITION, UNDERLAYER FILM-FORMING COMPOSITION, AND METHOD FOR PRODUCING IODINE-CONTAINING (METH)ACRYLATE COMPOUND | 三菱瓦斯化学株式会社 | 2025-04-24 | — | — | WO | disclosed |
| WO-2025079631-A1 | COMPOSITION, RESIN COMPOSITION, COMPOSITION FOR FILM FORMATION, COMPOSITION FOR FORMING LITHOGRAPHIC FILM, AND COMPOSITION FOR FORMING RESIST FILM | 三菱瓦斯化学株式会社 | 2025-04-17 | — | — | WO | disclosed |
| WO-2025079648-A1 | COMPOUND, COMPOSITION, RESIN COMPOSITION, COMPOSITION FOR FORMING FILM, COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, AND COMPOSITION FOR FORMING RESIST FILM | 三菱瓦斯化学株式会社 | 2025-04-17 | — | — | WO | disclosed |
| WO-2025033019-A1 | COMPOUND, COMPOSITION, METHOD FOR EXPRESSING SENSITIZING EFFECT, AND PRODUCTION METHOD | 三菱瓦斯化学株式会社 | 2025-02-13 | — | — | WO | disclosed |
| US-5952150-A | COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS | JSR CORPORATION (JP) | 1999-09-14 | — | — | US | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
| EP-0819981-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-01-21 | — | — | EP | disclosed |
| EP-0660187-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0428398-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| US-5110706-A | Photoresists for highly reflective substrates | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-05-05 | — | — | US | disclosed |
| EP-0428398-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-22 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260014100-A1 | Compositions and Methods for Treating Bleeding and Bleeding Disorders | SERPINC1, F2, F13B | MAPT 3297/4885MAOB 1004/4885MAOA 1902/4885 |
| US-12343317-B2 | Compositions and methods for treating bleeding and bleeding disorders | SERPINC1, SERPINE1, SERPINH1 | MAPT 3512/4885MAOB 2435/4885MAOA 3145/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.