SCHEMBL5482816

SCHEMBL5482816

CCO[PH](=O)Cc1ccc(C)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 3/20 0.41
CYP1A2 P05177 1/20 0.39
CYP2A6 P11509 1/20 0.39
TAAR1 Q96RJ0 1/20 0.39
AGXT P21549 2/20 0.38
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA9 Q16790 1/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
ALDH1A1 P00352 3/20 0.35
MAPT P10636 2/20 0.33
TP53 P04637 1/20 0.33
HPGD P15428 2/20 0.33
LMNA P02545 1/20 0.33
PKM P14618 1/20 0.33
ALOX12 P18054 1/20 0.33
STAT3 P40763 1/20 0.33
HTT P42858 1/20 0.33
KCNH2 Q12809 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10051635 0.86 TAAR1 (0.40) IDO1CYP2A6TAAR1CA2ALDH1A1
SCHEMBL27579738 0.84 LOXL2 (0.43) CYP1A2ALDH1A1MAPTLMNATDP1
SCHEMBL28012127 0.82 IDO1 (0.40) IDO1CYP1A2TAAR1AGXTALDH1A1
SCHEMBL27557933 0.82 TAAR1 (0.38) IDO1TAAR1MEN1KMT2AMAPT
SCHEMBL5002488 0.82 CYP3A4 (0.36) IDO1CYP1A2
SCHEMBL8814962 0.82 ESR1 (0.40) IDO1TAAR1CA1CA2CA9
SCHEMBL563886 0.82 TP53 (0.41) IDO1CYP2A6TAAR1ALDH1A1TP53
SCHEMBL11609893 0.81 IDO1 (0.48) IDO1TAAR1AGXTCA1CA2
SCHEMBL29282941 0.81 CYP1A2 (0.45) IDO1CYP1A2CYP2A6TAAR1AGXT
SCHEMBL11657265 0.79 LMNA (0.57) CYP1A2CA1CA2CA9MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1620108-B1 PYRAZOLE-AMINE COMPOUNDS USEFUL AS KINASE INHIBITORS BRISTOL MYERS SQUIBB CO (US) 2012-06-06 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed