SCHEMBL5483431

SCHEMBL5483431

Cc1ccc([Si](Cl)(Cl)Cl)cc1Cl

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.48
RAPGEF4 Q8WZA2 1/20 0.38
ALDH1A1 P00352 1/20 0.36
APOBEC3G Q9HC16 1/20 0.36
CD44 P16070 1/20 0.36
MAPT P10636 1/20 0.35
HTR3E A5X5Y0 1/20 0.35
HTR3B O95264 1/20 0.35
HTR3A P46098 1/20 0.35
HTR3D Q70Z44 1/20 0.35
HTR3C Q8WXA8 1/20 0.35
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
POLB P06746 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
ATM Q13315 1/20 0.35
KMO O15229 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29931166 0.80 ALDH1A1 (0.40) CYP3A4ALDH1A1MAPTNPC1RAB9A
SCHEMBL29406928 0.77 AHR (0.46) CYP3A4ALDH1A1HTR3EHTR3BHTR3A
SCHEMBL1717549 0.77 AHR (0.46) CYP3A4ALDH1A1HTR3EHTR3BHTR3A
SCHEMBL2197132 0.76 CYP3A4 (0.43) CYP3A4RAPGEF4ALDH1A1APOBEC3GMAPT
SCHEMBL5490961 0.74 ALDH1A1 (0.37) ALDH1A1NPC1RAB9A
SCHEMBL13609503 0.74 HDAC1 (0.37) ALDH1A1MAPTNPC1RAB9AMEN1
SCHEMBL17921311 0.73 CYP3A4 (0.41) CYP3A4RAPGEF4ALDH1A1APOBEC3GMAPT
SCHEMBL5485442 0.72
SCHEMBL8772397 0.71 CYP3A4 (0.48) CYP3A4RAPGEF4ALDH1A1CD44MAPT
SCHEMBL28802606 0.71 CYP3A4 (0.39) CYP3A4RAPGEF4ALDH1A1APOBEC3GMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7291747-B2 Silicon compounds and process for preparation thereof CHISSO CORPORATION (JP) 2007-11-06 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed