Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AHR | P35869 | 4/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 4/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.39 |
| ▸ | IDO1 | P14902 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | PNMT | P11086 | 1/20 | 0.34 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.34 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HTR3E | A5X5Y0 | 1/20 | 0.33 |
| ▸ | HTR3B | O95264 | 1/20 | 0.33 |
| ▸ | HTR3A | P46098 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29406928 | 1.00 | AHR (0.46) | AHRTP53TSHRHSD17B10CYP3A4 | |
| SCHEMBL5483431 | 0.77 | CYP3A4 (0.48) | CYP3A4ALDH1A1NPC1RAB9AMEN1 | |
| SCHEMBL12226216 | 0.76 | AHR (0.43) | AHRTP53TSHRHSD17B10CYP3A4 | |
| SCHEMBL31250605 | 0.76 | AHR (0.43) | AHRTP53TSHRHSD17B10CYP3A4 | |
| SCHEMBL5487414 | 0.72 | MAPT (0.44) | TP53HSD17B10ALDH1A1NPC1RAB9A | |
| SCHEMBL9631450 | 0.72 | AHR (0.40) | AHRTP53TSHRHSD17B10CYP3A4 | |
| SCHEMBL16714016 | 0.67 | — | — | |
| SCHEMBL134905 | 0.67 | LMNA (0.53) | TSHRHSD17B10CYP3A4IDO1ALDH1A1 | |
| SCHEMBL5485442 | 0.67 | — | — | |
| SCHEMBL2335006 | 0.65 | TSHR (0.44) | TP53TSHRCYP3A4IDO1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101657758-B | Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride | BREWER SCIENCE INC | 2015-03-04 | — | — | CN | claimed |
| CN-101258444-B | Negative photoresist for silicon KOH etch without silicon nitride | BREWER SCIENCE INC | 2013-04-03 | — | — | CN | claimed |
| EP-1932060-B1 | NEGATIVE PHOTOSENSITIVE COMPOSITION FOR SILICON KOH ETCH WITHOUT USING SILICON NITRIDE HARDMASK | BREWER SCIENCE INC (US) | 2013-03-27 | — | — | EP | claimed |
| US-7709178-B2 | Photoresist layer blend of acrylonitrile-styrene copolymer, (bis)phenol novolac epoxy resin, and photoacid generator of triarylsulfonium or diaryliodonium hexafluoroantimonate or hexafluoro-phosphate; silane dissolved inprimer layer; microelectromechanical systems, microelectronics; corrosion resistance | BREWER SCIENCE INC. (US) | 2010-05-04 | — | — | US | claimed |
| US-7695890-B2 | Negative photoresist for silicon KOH etch without silicon nitride | BREWER SCIENCE INC. (US) | 2010-04-13 | — | — | US | claimed |
| CN-101657758-A | Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride | BREWER SCIENCE INC US | 2010-02-24 | — | — | CN | claimed |
| EP-2142960-A1 | ALKALINE-RESISTANT NEGATIVE PHOTORESIST FOR SILICON WET-ETCH WITHOUT SILICON NITRIDE | Brewer Science, Inc. (US) | 2010-01-13 | — | — | EP | claimed |
| US-20080261145-A1 | Photoresist layer blend of acrylonitrile-styrene copolymer, (bis)phenol novolac epoxy resin, and photoacid generator of triarylsulfonium or diaryliodonium hexafluoroantimonate or hexafluoro-phosphate; silane dissolved inprimer layer; microelectromechanical systems, microelectronics; corrosion resistance | NAVY, SECRETARY OF THE UNITED STATES OF AMERICA | 2008-10-23 | — | — | US | claimed |
| WO-2008127785-A1 | ALKALINE-RESISTANT NEGATIVE PHOTORESIST FOR SILICON WET-ETCH WITHOUT SILICON NITRIDE | BREWER SCIENCE INC. (US) | 2008-10-23 | — | — | WO | claimed |
| CN-101258444-A | Negative photoresist for silicon KOH etch without silicon nitride | BREWER SCIENCE INC (US) | 2008-09-03 | — | — | CN | claimed |
| US-20070075309-A1 | NEGATIVE PHOTORESIST FOR SILICON KOH ETCH WITHOUT SILICON NITRIDE | BREWER SCIENCE INC. | 2007-04-05 | — | — | US | claimed |
| US-9299778-B2 | CVD-free, scalable processes for the production of silicon micro- and nanostructures | BREWER SCIENCE INC. (US) | 2016-03-29 | — | — | US | disclosed |
| CN-101657758-B | Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride | BREWER SCIENCE INC | 2015-03-04 | — | — | CN | disclosed |
| US-20140124898-A1 | CVD-FREE, SCALABLE PROCESSES FOR THE PRODUCTION OF SILICON MICRO- AND NANOSTRUCTURES | BREWER SCIENCE INC. (US) | 2014-05-08 | — | — | US | disclosed |
| US-8445591-B2 | Spin-on protective coatings for wet-etch processing of microelectronic substrates | BREWER SCIENCE INC. (US) | 2013-05-21 | — | — | US | disclosed |
| CN-1909977-A | Spin-on protective coatings for wet-etch processing of microelectronic substrates | BREWER SCIENCE INC (US) | 2007-02-07 | — | — | CN | disclosed |
| EP-1715961-A2 | SPIN-ON PROTECTIVE COATINGS FOR WET-ETCH PROCESSING OF MICROELECTRONIC SUBSTRATES | Brewer Science, Inc. (US) | 2006-11-02 | — | — | EP | disclosed |
| US-20060240181-A1 | SPIN-ON PROTECTIVE COATINGS FOR WET-ETCH PROCESSING OF MICROELECTRONIC SUBSTRATES | LI CHENGHONG | 2006-10-26 | — | — | US | disclosed |
| WO-2005072489-A2 | SPIN-ON PROTECTIVE COATINGS FOR WET-ETCH PROCESSING OF MICROELECTRONIC SUBSTRATES | BREWER SCIENCE INC. (US) | 2005-08-11 | — | — | WO | disclosed |
| US-20050158538-A1 | Spin-on protective coatings for wet-etch processing of microelectronic substrates | BREWER SCIENCE INC. | 2005-07-21 | — | — | US | disclosed |