SCHEMBL548391

SCHEMBL548391

Cc1ccc(C=O)c(C=O)c1C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.44
TSHR P16473 1/20 0.44
TDP1 Q9NUW8 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
LMNA P02545 1/20 0.36
THRB P10828 1/20 0.36
BLM P54132 1/20 0.36
KCNJ1 P48048 1/20 0.35
ERN1 O75460 2/20 0.33
NPC1 O15118 1/20 0.33
PKM P14618 1/20 0.33
RAB9A P51151 1/20 0.33
TDP2 O95551 1/20 0.33
NSD2 O96028 1/20 0.33
HSP90AA1 P07900 1/20 0.33
PAX8 Q06710 1/20 0.33
TRIM24 O15164 1/20 0.33
TRIM33 Q9UPN9 1/20 0.33
CYP1A2 P05177 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL548044 0.83 ALDH1A1 (0.46) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL1311843 0.82 ALDH1A1 (0.39) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL23175107 0.81 KCNJ1 (0.43) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL366594 0.80 ALDH1A1 (0.48) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL14577383 0.79 ERN1 (0.46) ALDH1A1TSHRERN1TRIM24TRIM33
SCHEMBL14456228 0.78 ALDH1A1 (0.35) ALDH1A1TSHR
SCHEMBL14876861 0.78 ALDH1A1 (0.46) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL548457 0.76 TDP1 (0.50) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL15518933 0.76 ALDH1A1 (0.40) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL11993044 0.74 ERN1 (0.44) ALDH1A1TSHRTDP1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 275 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2808736-B1 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2018-07-18 EP claimed
EP-2808736-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-12-03 EP claimed
EP-2662727-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-11-13 EP claimed
CN-116940559-A Cyclic diol compound, process for producing the compound, and use of the compound 新日本理化株式会社 2023-10-24 CN disclosed
CN-116829618-A Thermoplastic resin and optical lens comprising the same 三菱瓦斯化学株式会社 2023-09-29 CN disclosed
CN-108008600-B Radiation-sensitive composition 三菱瓦斯化学株式会社 2021-02-09 CN disclosed
EP-2080750-B1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2020-07-29 EP disclosed
EP-1890992-B1 AN ENRICHMENT PROCESS USING COMPOUNDS USEFUL IN A POLYESTER PROCESS GRUPO PETROTEMEX SA DE CV (MX) 2019-10-23 EP disclosed
EP-1888498-B1 A PROCESS TO PRODUCE AN ENRICHMENT FEED GRUPO PETROTEMEX SA DE CV (MX) 2019-06-26 EP disclosed
EP-1888497-B1 A PROCESS TO PRODUCE AN ENRICHED COMPOSITION THROUGH THE USE OF A CATALYST REMOVAL ZONE AND AN ENRICHMENT ZONE GRUPO PETROTEMEX SA DE CV (MX) 2019-04-17 EP disclosed
CN-104281006-B Radiation-ray sensitive composition 三菱瓦斯化学株式会社 2019-01-22 CN disclosed
US-20060047155-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047151-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047149-A1 Optimized liquid-phase oxidation GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047157-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047161-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047154-A1 Optimized liquid-phase oxidation GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047142-A1 Optimized liquid-phase oxidation GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047143-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047163-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed