SCHEMBL548044

SCHEMBL548044

Cc1ccc(C=O)c(C=O)c1C=O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.46
TSHR P16473 1/20 0.46
TDP1 Q9NUW8 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
LMNA P02545 1/20 0.38
THRB P10828 1/20 0.38
BLM P54132 1/20 0.38
ERN1 O75460 2/20 0.34
TRIM24 O15164 2/20 0.34
TRIM33 Q9UPN9 2/20 0.34
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C19 P33261 1/20 0.34
NPC1 O15118 1/20 0.34
PKM P14618 1/20 0.34
RAB9A P51151 1/20 0.34
CYP2A6 P11509 1/20 0.33
GRIA1 P42261 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3420520 0.87 ALDH1A1 (0.43) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL548457 0.84 TDP1 (0.50) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL548391 0.83 ALDH1A1 (0.44) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL14577383 0.81 ERN1 (0.46) ALDH1A1TSHRERN1TRIM24TRIM33
SCHEMBL9597660 0.79 ALDH1A1 (0.41) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL4580995 0.79 ERN1 (0.45) ALDH1A1TSHRERN1TRIM24TRIM33
SCHEMBL548632 0.78 ALDH1A1 (0.62) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL604701 0.75 ALDH1A1 (0.41) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL548164 0.74 CYP3A4 (0.47) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL1311843 0.74 ALDH1A1 (0.39) ALDH1A1TSHRTDP1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 210 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2808736-B1 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2018-07-18 EP claimed
EP-2808736-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-12-03 EP claimed
EP-2662727-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-11-13 EP claimed
EP-2080750-B1 RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2020-07-29 EP disclosed
EP-1890992-B1 AN ENRICHMENT PROCESS USING COMPOUNDS USEFUL IN A POLYESTER PROCESS GRUPO PETROTEMEX SA DE CV (MX) 2019-10-23 EP disclosed
EP-1888498-B1 A PROCESS TO PRODUCE AN ENRICHMENT FEED GRUPO PETROTEMEX SA DE CV (MX) 2019-06-26 EP disclosed
EP-1888497-B1 A PROCESS TO PRODUCE AN ENRICHED COMPOSITION THROUGH THE USE OF A CATALYST REMOVAL ZONE AND AN ENRICHMENT ZONE GRUPO PETROTEMEX SA DE CV (MX) 2019-04-17 EP disclosed
EP-2066612-B1 A PROCESS TO PRODUCE AN ENRICHMENT FEED GRUPO PETROTEMEX SA DE CV (MX) 2018-08-01 EP disclosed
US-10029973-B2 Optimized liquid-phase oxidation GROPO PETROTEMEX, S.A. DE C.V. (MX) 2018-07-24 US disclosed
EP-2808736-B1 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2018-07-18 EP disclosed
US-20180072648-A1 OPTIMIZED LIQUID-PHASE OXIDATION GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2018-03-15 US disclosed
US-20060047151-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047155-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047149-A1 Optimized liquid-phase oxidation GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047157-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047161-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047154-A1 Optimized liquid-phase oxidation GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047142-A1 Optimized liquid-phase oxidation GRUPO PETROTEMEX, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047143-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed
US-20060047163-A1 Optimized liquid-phase oxidation ALPEK POLYESTER, S.A. DE C.V. (MX) 2006-03-02 US disclosed