Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.42 |
| ▸ | TRIM33 | Q9UPN9 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.36 |
| ▸ | ERN1 | O75460 | 3/20 | 0.35 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.35 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.35 |
| ▸ | TLR2 | O60603 | 1/20 | 0.34 |
| ▸ | TLR1 | Q15399 | 1/20 | 0.34 |
| ▸ | TLR6 | Q9Y2C9 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL548215 | 0.84 | KMT2A (0.48) | MEN1KMT2ALMNATHRBBLM | |
| SCHEMBL6025866 | 0.82 | ALDH1A1 (0.39) | LMNATDP1ALDH1A1TSHRGABRA1 | |
| SCHEMBL15789332 | 0.82 | ERN1 (0.35) | MEN1KMT2ALMNATHRBBLM | |
| SCHEMBL11687669 | 0.81 | TYR (0.42) | MEN1KMT2ALMNATHRBBLM | |
| SCHEMBL17103416 | 0.81 | KMT2A (0.44) | MEN1KMT2ALMNATHRBBLM | |
| SCHEMBL27598016 | 0.81 | KMT2A (0.44) | MEN1KMT2ALMNATHRBBLM | |
| SCHEMBL2781560 | 0.81 | SLC6A2 (0.45) | MEN1KMT2ALMNATHRBBLM | |
| SCHEMBL18492705 | 0.80 | MEN1 (0.40) | MEN1KMT2ALMNATHRBBLM | |
| SCHEMBL15611394 | 0.79 | KMT2A (0.43) | MEN1KMT2ALMNATHRBBLM | |
| SCHEMBL5988255 | 0.79 | GABRA1 (0.46) | LMNAALDH1A1GABRA1GABRB2TAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070034600-A1 | Planarization Method of Patterning a Substratte | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2007-02-15 | — | — | US | claimed |
| US-20050156357-A1 | Planarization method of patterning a substrate | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2005-07-21 | — | — | US | claimed |
| US-20040112862-A1 | Planarization composition and method of patterning a substrate using the same | MOLECULAR IMPRINTS, INC. | 2004-06-17 | — | — | US | claimed |
| EP-2080750-B1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| EP-2911002-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-07-17 | — | — | EP | disclosed |
| EP-2505576-B1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-24 | — | — | EP | disclosed |
| EP-3007004-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-17 | — | — | EP | disclosed |
| US-9897913-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-20 | — | — | US | disclosed |
| EP-2599814-B1 | COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-02-14 | — | — | EP | disclosed |
| US-9785048-B2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-9746769-B2 | — | — | 2017-08-29 | — | — | US | disclosed |
| US-20050051698-A1 | Conforming template for patterning liquids disposed on substrates | MOLECULAR IMPRINTS, INC. (US) | 2005-03-10 | — | — | US | disclosed |
| US-20040112862-A1 | Planarization composition and method of patterning a substrate using the same | MOLECULAR IMPRINTS, INC. | 2004-06-17 | — | — | US | disclosed |
| US-6162841-A | Betaketosulphones derivatives suitable to the use as polymerization photoinitiators and photopolymerizable systems containing the same | LAMBERTI S.P.A. (IT) | 2000-12-19 | — | — | US | disclosed |
| EP-0850253-B1 | BETAKETOSULFONIC DERIVATIVES SUITABLE TO THE USE AS POLYMERIZATION PHOTOINITIATORS AND PHOTOPOLYMERIZABLE SYSTEMS CONTAINING THE SAME | LAMBERTI SPA (IT) | 1999-12-01 | — | — | EP | disclosed |
| EP-0850253-A1 | BETAKETOSULFONIC DERIVATIVES SUITABLE TO THE USE AS POLYMERIZATION PHOTOINITIATORS AND PHOTOPOLYMERIZABLE SYSTEMS CONTAINING THE SAME | LAMBERTI S.p.A. (IT) | 1998-07-01 | — | — | EP | disclosed |
| WO-1997010270-A1 | BETAKETOSULFONIC DERIVATIVES SUITABLE TO THE USE AS POLYMERIZATION PHOTOINITIATORS AND PHOTOPOLYMERIZABLE SYSTEMS CONTAINING THE SAME | LAMBERTI S.P.A. (IT) | 1997-03-20 | — | — | WO | disclosed |
| US-5026740-A | For transparent or pigmented mixtures | FRATELLI LAMBERTI S.P.A. (IT) | 1991-06-25 | — | — | US | disclosed |
| EP-0192967-B1 | SULPHURATED DERIVATIVES OF AROMATIC-ALIPHATIC AND ALIPHATIC KETONES AS POLYMERISATION PHOTOINITIATORS | FRATELLI LAMBERTI S.p.A. (IT) | 1990-08-01 | — | — | EP | disclosed |
| EP-0192967-A1 | Sulphurated derivatives of aromatic-aliphatic and aliphatic ketones as polymerisation photoinitiators | FRATELLI LAMBERTI S.p.A. (IT) | 1986-09-03 | — | — | EP | disclosed |