Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.36 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.34 |
| ▸ | ADRB2 | P07550 | 3/20 | 0.34 |
| ▸ | ADRB1 | P08588 | 3/20 | 0.34 |
| ▸ | HTR1A | P08908 | 1/20 | 0.34 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.34 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.34 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.34 |
| ▸ | BDKRB2 | P30411 | 1/20 | 0.34 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.34 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.34 |
| ▸ | HTR2B | P41595 | 1/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30641415 | 0.86 | GABRA1 (0.47) | ALDH1A1GABRA1GABRB2LMNAADRB2 | |
| SCHEMBL535990 | 0.86 | GABRA1 (0.47) | ALDH1A1GABRA1GABRB2LMNAADRB2 | |
| SCHEMBL7903417 | 0.83 | ALDH1A1 (0.41) | ALDH1A1GABRA1GABRB2CYP1A2TSHR | |
| SCHEMBL6289164 | 0.82 | ALDH1A1 (0.38) | ALDH1A1GABRA1GABRB2LMNAADRB2 | |
| SCHEMBL28579563 | 0.82 | SLC6A2 (0.45) | ALDH1A1ADRB1HTR1ASLC6A2SLC6A4 | |
| SCHEMBL3669290 | 0.82 | ALDH1A1 (0.38) | ALDH1A1GABRA1GABRB2LMNAADRB2 | |
| SCHEMBL548497 | 0.82 | MEN1 (0.44) | ALDH1A1GABRA1GABRB2LMNATSHR | |
| SCHEMBL810093 | 0.82 | ALDH1A1 (0.42) | ALDH1A1GABRA1GABRB2LMNAADRB2 | |
| SCHEMBL5033204 | 0.81 | ALDH1A1 (0.36) | ALDH1A1GABRA1GABRB2LMNAADRB2 | |
| SCHEMBL7056363 | 0.81 | ALDH1A1 (0.36) | ALDH1A1GABRA1GABRB2LMNAADRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0787750-B1 | Poly(alkylethylene) structural isomers | BOREALIS GMBH (AT) | 2003-05-14 | — | — | EP | claimed |
| US-4680358-A | Styryl terminated macromolecular monomers of polyethers | THE B F GOODRICH COMPANY (US) | 1987-07-14 | — | — | US | claimed |
| EP-0221551-A2 | Styryl terminated macromolecular monomers of polyethers | The B.F. GOODRICH Company (US) | 1987-05-13 | — | — | EP | claimed |
| EP-4749365-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-05-27 | — | — | EP | disclosed |
| CN-122072437-A | Chemically amplified negative resist composition and resist pattern forming method | 信越化学工业株式会社 | 2026-05-22 | — | — | CN | disclosed |
| US-20260063998-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-05 | — | — | US | disclosed |
| EP-4703798-A2 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-03-04 | — | — | EP | disclosed |
| EP-4703797-A2 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-03-04 | — | — | EP | disclosed |
| US-20260050216-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-19 | — | — | US | disclosed |
| US-20260010074-A1 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-08 | — | — | US | disclosed |
| EP-4675353-A1 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-20010016628-A1 | Modified with less than 5% by weight of monofunctional, difunctional and polyfunctional monomers; improved melt processability; sheets, films, panels, coatings, pipes, hollow objects and foams | BOREALIS GMBH (AU) | 2001-08-23 | — | — | US | disclosed |
| EP-1108723-A1 | Organosilyl radical generators and their applications | Ciba SC Holding AG (CH) | 2001-06-20 | — | — | EP | disclosed |
| EP-0910351-A1 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. Searle & Co. (US) | 1999-04-28 | — | — | EP | disclosed |
| EP-0907666-A1 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. Searle & Co. (US) | 1999-04-14 | — | — | EP | disclosed |
| WO-1997049736-A2 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. SEARLE AND CO. (US) | 1997-12-31 | — | — | WO | disclosed |
| WO-1997049387-A1 | PARTICLES COMPRISING AMPHIPHILIC COPOLYMERS, HAVING A CROSS-LINKED SHELL DOMAIN AND AN INTERIOR CORE DOMAIN, USEFUL FOR PHARMACEUTICAL AND OTHER APPLICATIONS | G.D. SEARLE AND CO. (US) | 1997-12-31 | — | — | WO | disclosed |
| EP-0787750-A2 | Poly(alkylethylene) structural isomers | PCD-Polymere Gesellschaft m.b.H. (AT) | 1997-08-06 | — | — | EP | disclosed |
| US-4680358-A | Styryl terminated macromolecular monomers of polyethers | THE B F GOODRICH COMPANY (US) | 1987-07-14 | — | — | US | disclosed |
| EP-0221551-A2 | Styryl terminated macromolecular monomers of polyethers | The B.F. GOODRICH Company (US) | 1987-05-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260050216-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | NAF1, CHRM1, ARCN1 | ALDH1A1 1395/4885GABRA1 1120/4885GABRB2 1330/4885 |
| US-20260063998-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | MTX1, CHRM1, POLQ | ALDH1A1 1919/4885GABRA1 2209/4885GABRB2 1912/4885 |
| US-20260010074-A1 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | NAF1, ASIC1, GRIN1 | ALDH1A1 3100/4885GABRA1 1952/4885GABRB2 2393/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.