SCHEMBL548546

SCHEMBL548546

CC(=O)c1ccc(C(C)(C)O)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.49
NR1H4 Q96RI1 1/20 0.49
MAPT P10636 4/20 0.48
HPGD P15428 3/20 0.48
KMT2A Q03164 2/20 0.48
LMNA P02545 2/20 0.48
L3MBTL1 Q9Y468 2/20 0.48
RAB9A P51151 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.46
HSD17B1 P14061 1/20 0.46
ALDH1A1 P00352 2/20 0.46
MEN1 O00255 1/20 0.46
MAPK1 P28482 2/20 0.43
NOS3 P29474 2/20 0.43
NOS1 P29475 2/20 0.43
HDAC1 Q13547 1/20 0.43
MAOB P27338 1/20 0.42
KIF11 P52732 1/20 0.42
SRD5A2 P31213 1/20 0.42
NPC1 O15118 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8363133 0.94 MAPT (0.57) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL4492464 0.94 MAPT (0.57) EPHX2NR1H4MAPTHPGDKMT2A
P-Methoxy-Acetophenone SCHEMBL18741339 0.87 MAPT (0.56) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL379246 0.85 ALDH1A1 (0.57) EPHX2MAPTKMT2ALMNAALDH1A1
Acetophenone SCHEMBL27509078 0.85 MAPT (0.52) MAPTHPGDKMT2ALMNARAB9A
SCHEMBL547765 0.83 SRD5A2 (0.59) MAPTHPGDLMNARAB9ASMN1; SMN2
SCHEMBL11278492 0.83 MAPT (0.51) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL397829 0.83 EPHX2 (0.65) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL677816 0.83 MAPT (0.50) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL9472225 0.83 HPGD (0.50) EPHX2NR1H4MAPTHPGDKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 161 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0111043-A1 Stabilised electrical insulating composition Licentia Patent-Verwaltungs-GmbH (DE) 1984-06-20 EP claimed
EP-0089490-A1 Insulation stabilized against high voltage Licentia Patent-Verwaltungs-GmbH (DE) 1983-09-28 EP claimed
US-4088699-A PRODUCTION OF ARALKYL TERTIARY HYDROPEROXIDES THE GOODYEAR TIRE & RUBBER COMPANY (US) 1978-05-09 US claimed
US-3978142-A BY ACID REARRANGEMENT 3978142 MOD 3978142 AND CLEAVAGE OF ARALKYL TERTIARY POLYHYDROPEROXIDE THE GOODYEAR TIRE & RUBBER COMPANY (US) 1976-08-31 US claimed
EP-4709725-A1 HETEROCYCLIC COMPOUNDS AND USES THEREOF Progentos Therapeutics, Inc. (US) 2026-03-18 EP disclosed
US-12161624-B2 Selective octahydro-cyclopenta[c]pyrrole negative modulators of NR2B NOVARTIS AG (CH) 2024-12-10 US disclosed
WO-2024233642-A1 HETEROCYCLIC COMPOUNDS AND USES THEREOF PROGENTOS THERAPEUTICS, INC. (US) 2024-11-14 WO disclosed
US-11852970-B2 Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-26 US disclosed
CN-114685243-B Green and efficient preparation method of 2-phenyl-2-propanol series compounds 大连理工大学 2023-02-07 CN disclosed
US-11572430-B2 Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-02-07 US disclosed
US-20230012073-A1 SELECTIVE OCTAHYDRO-CYCLOPENTA[C]PYRROLE NEGATIVE MODULATORS OF NR2B CADENT THERAPEUTICS, INC. (US) 2023-01-12 US disclosed
US-20230012073-A1 SELECTIVE OCTAHYDRO-CYCLOPENTA[C]PYRROLE NEGATIVE MODULATORS OF NR2B CADENT THERAPEUTICS, INC. (US) 2023-01-12 US disclosed
EP-0111043-A1 Stabilised electrical insulating composition Licentia Patent-Verwaltungs-GmbH (DE) 1984-06-20 EP disclosed
US-4307223-A CONTAINING PHENOLIC CONSTITUENTS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1981-12-22 US disclosed
US-4152294-A MULTISTAGE PREPARATION AND PURIFICATION OF P-DIISOPROPYLBENZENE MONOHYDROPEROXIDE, AQUEOUS EMULSION POLYMERIZATION THE GOODYEAR TIRE & RUBBER COMPANY (US) 1979-05-01 US disclosed
US-4152293-A MULTISTAGE PREPARATION AND PURIFICATION OF P-DIISOPROPYLBENZENE MONOHYDROPEROXIDE THE GOODYEAR TIRE & RUBBER COMPANY (US) 1979-05-01 US disclosed
US-4136123-A ALKALI METAL SULFONATE DERIVATIVES THE GOODYEAR TIRE & RUBBER COMPANY (US) 1979-01-23 US disclosed
US-4088699-A PRODUCTION OF ARALKYL TERTIARY HYDROPEROXIDES THE GOODYEAR TIRE & RUBBER COMPANY (US) 1978-05-09 US disclosed
US-4080386-A OXIDATION OF AN ARYL TERTIARY ALKANE, TREATING RECYCLE STREAM WITH AN ALKALINE EXTRACTANT THE GOODYEAR TIRE & RUBBER CO. (US) 1978-03-21 US disclosed
US-3978142-A BY ACID REARRANGEMENT 3978142 MOD 3978142 AND CLEAVAGE OF ARALKYL TERTIARY POLYHYDROPEROXIDE THE GOODYEAR TIRE & RUBBER COMPANY (US) 1976-08-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11852970-B2 Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin SLC39A11, CROCC, TERB1 EPHX2 1686/4885NR1H4 851/4885MAPT 1634/4885
US-20230012073-A1 SELECTIVE OCTAHYDRO-CYCLOPENTA[C]PYRROLE NEGATIVE MODULATORS OF NR2B GRIN2A, GRIN2C, GRIN3A EPHX2 3355/4885NR1H4 97/4885MAPT 1173/4885
US-11572430-B2 Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method C9, C5, C1R EPHX2 473/4885NR1H4 749/4885MAPT 3986/4885
US-12161624-B2 Selective octahydro-cyclopenta[c]pyrrole negative modulators of NR2B GRIN2A, GRIN2C, GRIN3A EPHX2 3355/4885NR1H4 97/4885MAPT 1173/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.