Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SRD5A2 | P31213 | 4/20 | 0.59 |
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | ELANE | P08246 | 4/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | PKM | P14618 | 2/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | ESR1 | P03372 | 1/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.44 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | CNR1 | P21554 | 1/20 | 0.42 |
| ▸ | CNR2 | P34972 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547672 | 0.91 | ALDH1A1 (0.58) | SRD5A2ALDH1A1LMNAELANEMAPT | |
| SCHEMBL548387 | 0.89 | SRD5A2 (0.50) | SRD5A2SIRT1ALDH1A1LMNAELANE | |
| SCHEMBL28827166 | 0.89 | SRD5A2 (0.55) | SRD5A2SIRT1LMNAELANEMAPT | |
| SCHEMBL547647 | 0.84 | SRD5A2 (0.54) | SRD5A2SIRT1TDP1 | |
| SCHEMBL107049 | 0.83 | SRD5A2 (0.63) | SRD5A2ALDH1A1SMN1; SMN2TDP1 | |
| SCHEMBL548546 | 0.83 | EPHX2 (0.49) | SRD5A2ALDH1A1LMNAMAPTHPGD | |
| SCHEMBL1148445 | 0.82 | SRD5A2 (0.83) | SRD5A2SIRT1ALDH1A1LMNAMAPT | |
| SCHEMBL10946728 | 0.82 | SRD5A2 (0.83) | SRD5A2SIRT1ALDH1A1LMNAMAPT | |
| SCHEMBL6757198 | 0.82 | SRD5A2 (0.61) | SRD5A2SIRT1ALDH1A1LMNAELANE | |
| SCHEMBL548036 | 0.82 | SRD5A2 (0.43) | SRD5A2SIRT1ALDH1A1LMNAELANE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114045148-B | Photo-thermal dual-curing heat-conducting adhesive composition and preparation method thereof | 广东睿华新材料科技有限公司 | 2023-09-15 | — | — | CN | claimed |
| CN-114045148-A | Light-heat dual-curing adhesive and application thereof in blade lithium battery for vehicle | 广州市麦冬科技有限公司 | 2022-02-15 | — | — | CN | claimed |
| CN-111286297-A | High-strength ultraviolet/moisture dual-curing adhesive and preparation method and use method thereof | 天津斯多福新材料研发有限公司 | 2020-06-16 | — | — | CN | claimed |
| US-4975471-A | Photo-curable epoxy resin type composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-12-04 | — | — | US | claimed |
| CN-117965125-A | Flexible polyurethane acrylate adhesive for bonding ultrathin frameless liquid crystal display and preparation method thereof | 滁州惠科光电科技有限公司 | 2024-05-03 | — | — | CN | disclosed |
| CN-114096590-B | UV and/or thermally curable silicone-based materials and formulations | 汉高股份有限及两合公司 | 2024-04-19 | — | — | CN | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| CN-115572573-B | Polyurethane hot melt adhesive for intelligent wearing and preparation method thereof | 深圳市优威高乐技术有限公司 | 2023-12-19 | — | — | CN | disclosed |
| CN-114045148-B | Photo-thermal dual-curing heat-conducting adhesive composition and preparation method thereof | 广东睿华新材料科技有限公司 | 2023-09-15 | — | — | CN | disclosed |
| CN-113039245-B | Dual curable silicone-organic hybrid polymer compositions for liquid optically clear adhesive applications | 汉高股份有限及两合公司 | 2023-09-12 | — | — | CN | disclosed |
| CN-114874704-B | Adhesive composition and display device | 业成科技（成都）有限公司 | 2023-06-02 | — | — | CN | disclosed |
| CN-116063962-A | Optically transparent water-resistant protective film composition based on double-network structure | 常熟理工学院 | 2023-05-05 | — | — | CN | disclosed |
| EP-0409520-B1 | Novel dialkyl peroxides, production method and use thereof | NIPPON OILS & FATS CO LTD (JP) | 1994-09-14 | — | — | EP | disclosed |
| US-5091586-A | Photolysis type or pyrolysis type forming agents | NIPPON OIL AND FATS COMPANY, LIMITED (JP) | 1992-02-25 | — | — | US | disclosed |
| US-5055378-A | Radiation curable acrylated Bisphenol A novolak epoxy resins; curing agents, fillers, photoinitiators; protective coating for printed circuit | KABUSHIKI KAISHA TOSHIBA (JP) | 1991-10-08 | — | — | US | disclosed |
| EP-0409520-A2 | Novel dialkyl peroxides, production method and use thereof | NIPPON OIL AND FATS COMPANY, LIMITED (JP) | 1991-01-23 | — | — | EP | disclosed |
| US-4925773-A | PHOTOCURABLE RESIN | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-05-15 | — | — | US | disclosed |
| EP-0273729-A2 | Solder resist ink composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1988-07-06 | — | — | EP | disclosed |
| US-4691058-A | Process for producing 1-hydroxy ketones | CIBA-GEIGY CORPORATION (US) | 1987-09-01 | — | — | US | disclosed |
| EP-0193643-A2 | Curable resin composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1986-09-10 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | SRD5A2 2223/4885SIRT1 2685/4885ALDH1A1 3830/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.