SCHEMBL5485754

SCHEMBL5485754

C=C[SiH](C=C)O[SiH3].c1ccc2c(c1)-c1ccccc1-2

nearest known ligand 0.31

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.31
MEN1 O00255 1/20 0.31
CES2 O00748 1/20 0.31
APAF1 O14727 1/20 0.31
TERT O14746 1/20 0.31
NPC1 O15118 1/20 0.31
PLIN1 O60240 1/20 0.31
TDP2 O95551 1/20 0.31
S1PR4 O95977 1/20 0.31
LMNA P02545 1/20 0.31
PLA2G1B P04054 1/20 0.31
BCHE P06276 1/20 0.31
POLB P06746 1/20 0.31
PTPRC P08575 1/20 0.31
MAPT P10636 1/20 0.31
THRB P10828 1/20 0.31
PLCG1 P19174 1/20 0.31
MAOA P21397 1/20 0.31
S1PR1 P21453 1/20 0.31
CES1 P23141 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27877890 0.82 GAA (0.30) MAPT
SCHEMBL3512754 0.82 GAA (0.30) MAPT
SCHEMBL9458712 0.80 TSHR (0.37) CES1
SCHEMBL160834 0.79
SCHEMBL15674500 0.76
SCHEMBL472894 0.76
SCHEMBL6924024 0.69 MEN1 (0.47) KDM4EMEN1CES2APAF1TERT
SCHEMBL7529941 0.69
SCHEMBL485788 0.65 ALDH1A1 (0.33) ALDH1A1
Propene SCHEMBL3281811 0.64 MEN1 (0.42) KDM4EMEN1CES2APAF1TERT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7270849-B2 Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film NEC CORPORATION (JP) 2007-09-18 US disclosed
US-20070157884-A1 ORGANOSILOXANE COPOLYMER FILM, PRODUCTION METHOD AND DEPOSITION APPARATUS FOR SAID COPOLYMER FILM, AND SEMICONDUCTOR DEVICE USING SAID COPOLYMER FILM NEC CORPORATION (JP) 2007-07-12 US disclosed
US-20050267253-A1 Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film GODO KAISHA IP BRIDGE 1 (JP) 2005-12-01 US disclosed