⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10644505 | 0.82 | — | — | |
| SCHEMBL7260805 | 0.75 | LMNA (0.34) | — | |
| SCHEMBL17541606 | 0.73 | — | — | |
| SCHEMBL27332692 | 0.71 | — | — | |
| SCHEMBL9254062 | 0.71 | — | — | |
| SCHEMBL27495376 | 0.71 | — | — | |
| SCHEMBL28079712 | 0.71 | — | — | |
| SCHEMBL16296076 | 0.71 | — | — | |
| SCHEMBL2906953 | 0.71 | — | — | |
| SCHEMBL28279446 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11530288-B2 | Anhydrous routes to highly processable covalent network polymers and blends | MALLINDA (US) | 2022-12-20 | — | — | US | claimed |
| EP-3847201-A1 | ANHYDROUS ROUTES TO HIGHLY PROCESSABLE COVALENT NETWORK POLYMERS AND BLENDS | Mallinda (US) | 2021-07-14 | — | — | EP | claimed |
| US-20200247937-A1 | ANHYDROUS ROUTES TO HIGHLY PROCESSABLE COVALENT NETWORK POLYMERS AND BLENDS | MALLINDA | 2020-08-06 | — | — | US | claimed |
| EP-2808736-B1 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-07-18 | — | — | EP | claimed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | claimed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | claimed |
| US-11530288-B2 | Anhydrous routes to highly processable covalent network polymers and blends | MALLINDA (US) | 2022-12-20 | — | — | US | disclosed |
| CN-113980926-A | Magnetic nanoparticle-glycosyltransferase-amorphous metal organic framework composite catalytic material and preparation method and application thereof | 南京师范大学 | 2022-01-28 | — | — | CN | disclosed |
| EP-3847201-A1 | ANHYDROUS ROUTES TO HIGHLY PROCESSABLE COVALENT NETWORK POLYMERS AND BLENDS | Mallinda (US) | 2021-07-14 | — | — | EP | disclosed |
| US-20200247937-A1 | ANHYDROUS ROUTES TO HIGHLY PROCESSABLE COVALENT NETWORK POLYMERS AND BLENDS | MALLINDA | 2020-08-06 | — | — | US | disclosed |
| EP-2080750-B1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| EP-2808736-B1 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-07-18 | — | — | EP | disclosed |
| US-9897913-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-7919223-B2 | Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-02-25 | — | — | US | disclosed |
| EP-2080750-A1 | RADIATION-SENSITIVE COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-7091281-B2 | emulsion polymerization of an acrylic resin having an epoxy group and a hydroxyl group in the side chain, an unsaturated anionic emulsifier, an imidazole or imidazoline catalyst, and a silane compound having an epoxy and alkoxy group; improved corrosion resistance of electrically less noble metal alloys | TORAY FINE CHEMICALS CO., LTD. (JP) | 2006-08-15 | — | — | US | disclosed |
| US-20040220306-A1 | Curable coating composition | TORAY FINE CHEMICALS CO., LTD., A CORPORATION OF JAPAN (JP) | 2004-11-04 | — | — | US | disclosed |