SCHEMBL5486639

SCHEMBL5486639

O=P(O)(O)CC[Si](O)(O)O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYMS P04818 1/20 0.47
ALDH1A1 P00352 3/20 0.43
LMNA P02545 1/20 0.39
CYP3A4 P08684 1/20 0.39
NFKB1 P19838 1/20 0.39
BLM P54132 1/20 0.39
PMP22 Q01453 1/20 0.39
ANPEP P15144 1/20 0.39
KDM4E B2RXH2 1/20 0.37
MMP2 P08253 1/20 0.37
THRB P10828 1/20 0.37
MAPK1 P28482 1/20 0.37
HSD17B10 Q99714 1/20 0.37
LPAR3 Q9UBY5 3/20 0.36
LPAR2 Q9HBW0 1/20 0.36
BBOX1 O75936 2/20 0.35
GRM4 Q14833 1/20 0.35
PGK1 P00558 1/20 0.32
PGK2 P07205 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4538237 0.82 TYMS (0.58) TYMSALDH1A1LMNACYP3A4NFKB1
SCHEMBL6049137 0.81 TYMS (0.47) TYMSALDH1A1LMNACYP3A4NFKB1
SCHEMBL18391 0.80 TYMS (0.55) TYMSALDH1A1LMNACYP3A4NFKB1
SCHEMBL26037359 0.73 S1PR2 (0.47) TYMSLMNACYP3A4NFKB1BLM
SCHEMBL27898884 0.73 TYMS (0.45) TYMSALDH1A1LMNACYP3A4NFKB1
SCHEMBL8352725 0.71 TYMS (0.69) TYMSALDH1A1LMNACYP3A4NFKB1
SCHEMBL81370 0.71 TYMS (0.69) TYMSALDH1A1LMNACYP3A4NFKB1
SCHEMBL17680119 0.69 TYMS (0.36) TYMSALDH1A1LMNACYP3A4NFKB1
SCHEMBL6512048 0.68 TYMS (0.64) TYMSALDH1A1LMNACYP3A4NFKB1
SCHEMBL10632896 0.68 TYMS (0.64) TYMSALDH1A1LMNACYP3A4NFKB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-1204793-A None JP disclosed
CN-110628435-B Silicon nitride film etching composition 易案爱富科技有限公司 2022-04-05 CN disclosed
US-11149201-B2 Silicon nitride layer etching composition ENF TECHNOLOGY CO., LTD. (KR) 2021-10-19 US disclosed
CN-110628435-A Silicon nitride film etching composition 易案爱富科技有限公司 2019-12-31 CN disclosed
US-20170275495-A1 AQUEOUS COMPOSITIONS FOR COATING METALLIC SURFACES, METHODS, AND ARTICLES 3M INNOVATIVE PROPERTIES COMPANY 2017-09-28 US disclosed
US-8710108-B2 Proton conducting electrolytes with cross-linked copolymer additives for use in fuel cells DAIMLER AG (DE) 2014-04-29 US disclosed
US-8709677-B2 Proton conducting electrolytes with cross-linked copolymer additives for use in fuel cells DAIMLER AG (DE) 2014-04-29 US disclosed
US-20120225958-A1 PROTON CONDUCTING ELECTROLYTES WITH CROSS-LINKED COPOLYMER ADDITIVES FOR USE IN FUEL CELLS FORD MOTOR COMPANY (US) 2012-09-06 US disclosed
US-20120225372-A1 PROTON CONDUCTING ELECTROLYTES WITH CROSS-LINKED COPOLYMER ADDITIVES FOR USE IN FUEL CELLS FORD MOTOR COMPANY (US) 2012-09-06 US disclosed
US-20100184103-A1 METHODS OF USE OF SOLID SUPPORT MATERIAL FOR BINDING BIOMOLECULES 3M INNOVATIVE PROPERTIES COMPANY 2010-07-22 US disclosed
US-20050113547-A1 Phosphonic-acid grafted hybrid inorganic-organic proton electrolyte membranes (PEMs) TOYOTA MOTOR CORPORATION (JP) 2005-05-26 US disclosed
WO-2005027240-A2 PHOSPHONIC-ACID GRAFTED HYBRID INORGANIC-ORGANIC PROTON ELECTROLYTE MEMBRANES (PEMs) TOYOTA TECHNICAL CENTER USA, INC. (US) 2005-03-24 WO disclosed
US-5262278-A Film-forming solution of acrylic copolymer which has been reacted with glycidyl (meth)acrylate, also phosphoric ester of hydroxyalkyl (meth)acrylate and other unsaturated monomer, for photosensitive coatings BASF AKTIENGESELLSCHAFT (DE) 1993-11-16 US disclosed
US-5217813-A Offset printing plates BASF AKTIENGESELLSCHAFT (DE) 1993-06-08 US disclosed
US-5073475-A PRODUCTION OF PLATE-LIKE, SHEET-LIKE OR TAPE-LIKE MATERIALS AND OF SENSITIZED LITHOGRAPHIC PRINTING PLATES BASF AKTIENGESELLSCHAFT (DE) 1991-12-17 US disclosed
EP-0322658-B1 DAMPING SOLUTION FOR OFFSET PRINTING BASF Aktiengesellschaft (DE) 1991-08-07 EP disclosed
EP-0418575-A2 Process for the manufacture of plates, foils, or sheet-like materials and process for the manufacture of presensitized lithographic printing plates BASF Aktiengesellschaft (DE) 1991-03-27 EP disclosed
US-4970138-A Damping solution for offset printing BASF AKTIENGESELLSCHAFT (DE) 1990-11-13 US disclosed
JP-H01204793-A DAMPING SOLUTION FOR OFFSET PRINTING BASF AG 1989-08-17 JP disclosed
EP-0322658-A1 Damping solution for offset printing BASF Aktiengesellschaft (DE) 1989-07-05 EP disclosed