⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705738 | 0.82 | — | — | |
| SCHEMBL5485162 | 0.75 | — | — | |
| SCHEMBL11660686 | 0.71 | ESR1 (0.35) | — | |
| SCHEMBL7693813 | 0.68 | ALDH1A1 (0.39) | — | |
| SCHEMBL28988285 | 0.67 | ALDH1A1 (0.38) | — | |
| SCHEMBL11616888 | 0.66 | — | — | |
| SCHEMBL5488203 | 0.65 | — | — | |
| Propene SCHEMBL3281811 | 0.64 | MEN1 (0.42) | — | |
| Phthalic Anhydride SCHEMBL9640625 | 0.64 | TDP1 (0.56) | — | |
| SCHEMBL22580518 | 0.64 | CA4 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7270849-B2 | Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film | NEC CORPORATION (JP) | 2007-09-18 | — | — | US | disclosed |
| US-20070157884-A1 | ORGANOSILOXANE COPOLYMER FILM, PRODUCTION METHOD AND DEPOSITION APPARATUS FOR SAID COPOLYMER FILM, AND SEMICONDUCTOR DEVICE USING SAID COPOLYMER FILM | NEC CORPORATION (JP) | 2007-07-12 | — | — | US | disclosed |
| US-20050267253-A1 | Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film | GODO KAISHA IP BRIDGE 1 (JP) | 2005-12-01 | — | — | US | disclosed |