SCHEMBL5488527

SCHEMBL5488527

O=C(O)C=COCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28510587 0.87 TSHR (0.44)
SCHEMBL29022873 0.80 HCAR2 (0.44)
SCHEMBL14275296 0.79
SCHEMBL5493233 0.79
SCHEMBL17049105 0.78 TSHR (0.36)
SCHEMBL5489821 0.78
SCHEMBL22348456 0.78
SCHEMBL3990293 0.78
SCHEMBL7249232 0.76 TSHR (0.41)
SCHEMBL7178599 0.76 HCAR2 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115494698-A Method for manufacturing semiconductor device and photoresist 台湾积体电路制造股份有限公司 2022-12-20 CN disclosed
CN-113248955-B Ultraviolet-curable coating composition 株式会社KCC 2022-08-09 CN disclosed
EP-3166797-B1 RADIATION-CURABLE INKJET INKS AND COATINGS SUN CHEMICAL CORP (US) 2022-04-06 EP disclosed
CN-111826242-A Cleaning solution, method of cleaning semiconductor substrate, and method of manufacturing semiconductor device 台湾积体电路制造股份有限公司 2020-10-27 CN disclosed
US-20170204282-A1 RADIATION-CURABLE INKJET INKS AND COATINGS SUN CHEMICAL CORPORATION (US) 2017-07-20 US disclosed
EP-3166797-A1 RADIATION-CURABLE INKJET INKS AND COATINGS Sun Chemical Corporation (US) 2017-05-17 EP disclosed
WO-2016007593-A1 RADIATION-CURABLE INKJET INKS AND COATINGS SUN CHEMICAL CORPORATION (US) 2016-01-14 WO disclosed
US-20070072124-A1 Optical recording composition, production method thereof and optical recording medium FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed