SCHEMBL549021

SCHEMBL549021

CCC1(O)C2CC3CC(C2)CC1C3

nearest known ligand 0.65

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
HSD11B1 P28845 2/20 0.32
GRIN2D O15399 1/20 0.31
GRIN3B O60391 1/20 0.31
GRIN1 Q05586 1/20 0.31
GRIN2A Q12879 1/20 0.31
GRIN2B Q13224 1/20 0.31
GRIN2C Q14957 1/20 0.31
GRIN3A Q8TCU5 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15922930 1.00 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2HSD11B1GRIN2DGRIN3B
SCHEMBL5017321 0.97 ALDH1A1 (0.41) ALDH1A1SMN1; SMN2HSD11B1GRIN2DGRIN3B
SCHEMBL29078864 0.97 ALDH1A1 (0.41) ALDH1A1SMN1; SMN2HSD11B1GRIN2DGRIN3B
Methacrylic Acid SCHEMBL2110242 0.82 HSD11B1 (0.35) ALDH1A1SMN1; SMN2HSD11B1
SCHEMBL4712185 0.80 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2HSD11B1
SCHEMBL15923054 0.80 ALDH1A1 (0.40) ALDH1A1SMN1; SMN2HSD11B1
SCHEMBL6526108 0.79 GRIN2D (0.40) ALDH1A1SMN1; SMN2GRIN2DGRIN3BGRIN1
SCHEMBL29078826 0.78 ALDH1A1 (0.39) ALDH1A1SMN1; SMN2
Hydrochloric Acid SCHEMBL15211145 0.77 GRIN2D (0.39) ALDH1A1SMN1; SMN2GRIN2DGRIN3BGRIN1
SCHEMBL2803563 0.77 ALDH1A1 (0.38) ALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 164 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250075147-A1 FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NEW FLAVOR AND FRAGRANCE INGREDIENTS OSMO LABS, PBC 2025-03-06 US claimed
CN-117623918-A Preparation method of acrylic resin monomer for 193nm photoresist 河北凯力昂生物科技有限公司 2024-03-01 CN claimed
CN-116789600-A Preparation method and application of novel tetrahydroindazole antitumor compound 深圳市人民医院 2023-09-22 CN claimed
CN-116789887-A Ionic photoacid generator film-forming resin copolymer, preparation method and application 中国科学院福建物质结构研究所 2023-09-22 CN claimed
CN-112159309-B Purification method of 2-ethyl-2-adamantanol 浙江荣耀生物科技股份有限公司 2023-05-02 CN claimed
CN-112159309-A Purification method of 2-ethyl-2-adamantanol 浙江荣耀生物科技股份有限公司 2021-01-01 CN claimed
CN-109679020-B Cubane-containing acrylate film-forming resin and ArF photoresist as well as preparation method and photoetching method thereof 厦门恒坤新材料科技股份有限公司 2020-12-29 CN claimed
CN-105594714-A Insecticide for preventing houseflies YANTAI MILUOKA CHEMICAL TECH CO LTD 2016-05-25 CN claimed
CN-101811963-B Method for synthesizing photoresist-monomer carbon-rigid-skeleton acrylic ester compounds by transesterification JIANGSU DACHENG PHARMACEUTICAL AND CHEMICAL CO LTD 2013-06-19 CN claimed
CN-101811963-A Method for synthesizing photoresist-monomer carbon-rigid-skeleton acrylic ester compounds by transesterification JIANGSU DACHENG PHARMACEUTICAL AND CHEMICAL CO LTD 2010-08-25 CN claimed
CN-101798263-A Method for preparing unsaturated adamantane ester UNIV BEIJING CHEMICAL 2010-08-11 CN claimed
US-20250075147-A1 FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NEW FLAVOR AND FRAGRANCE INGREDIENTS OSMO LABS, PBC 2025-03-06 US disclosed
WO-2024167967-A2 FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING ADAMANTANE DERIVATIVES OSMO LABS, PBC. (US) 2024-08-15 WO disclosed
CN-117623918-A Preparation method of acrylic resin monomer for 193nm photoresist 河北凯力昂生物科技有限公司 2024-03-01 CN disclosed
CN-116444438-B Benzamide compound and preparation method, using method and application thereof 深圳市人民医院 2024-02-13 CN disclosed
US-6239231-B1 HAS THE POLYMERIZATION UNIT OF 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE AND ONE OR BOTH OF THE POLYMERIZATION UNIT OF 3-HYDROXY-1-ADAMANTYL (METH)ACRYLATE OR (METH)ACRYLONITRILE; ACID GENERATOR; SEMICONDUCTORS SUMITOMO CHEMICAL, COMPANY LIMITED (JP) 2001-05-29 US disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0982628-A2 A chemical amplifying type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-03-01 EP disclosed
CN-1245910-A Chemical intensified positive photoresist composite SUMITOMO CHEMICAL CO (JP) 2000-03-01 CN disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed