SCHEMBL5490646

SCHEMBL5490646

CCc1cc(N(C)C)ccc1C(=O)OC(C)=O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PSMB5 P28074 1/20 0.38
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
RAB9A P51151 3/20 0.36
HSD17B1 P14061 1/20 0.36
MAOA P21397 2/20 0.35
MAOB P27338 2/20 0.35
ALDH1A1 P00352 7/20 0.35
MAPT P10636 6/20 0.35
HPGD P15428 6/20 0.35
NPC1 O15118 4/20 0.35
SMN1; SMN2 Q16637 3/20 0.35
TP53 P04637 1/20 0.35
TSHR P16473 3/20 0.35
LMNA P02545 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2C19 P33261 1/20 0.35
KDM4E B2RXH2 3/20 0.35
HSD17B10 Q99714 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6891969 0.84 ALDH1A1 (0.44) PSMB5KMT2ARAB9AALDH1A1MAPT
SCHEMBL8995796 0.79 LMNA (0.40) MEN1KMT2ARAB9AHSD17B1ALDH1A1
SCHEMBL5310575 0.79 PSMB5 (0.34) PSMB5MEN1KMT2ARAB9AHSD17B1
SCHEMBL7601521 0.78 SLC16A3 (0.46) PSMB5MEN1KMT2ARAB9AMAOA
SCHEMBL41899 0.78 SLC16A3 (0.46) PSMB5MEN1KMT2ARAB9AMAOA
SCHEMBL9339509 0.78 RAB9A (0.40) PSMB5MEN1KMT2ARAB9AMAOA
SCHEMBL5567273 0.78 FLT1 (0.48) MEN1KMT2AHSD17B1ALDH1A1MAPT
Ammonia Solution, Strong SCHEMBL4440047 0.77 SLC16A3 (0.45) PSMB5MEN1KMT2ARAB9AMAOA
SCHEMBL3089078 0.76 ALDH1A1 (0.47) MEN1KMT2ARAB9AALDH1A1HPGD
SCHEMBL1830432 0.76 ALDH1A1 (0.43) MEN1KMT2ARAB9AMAOAMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3083881-B1 MOLECULAR GLASS MIXTURES FOR ORGANIC ELECTRONICS APPLICATIONS MOLECULAR GLASSES INC (US) 2020-09-09 EP disclosed
US-10461269-B2 Crosslinkable, /polymerizable and combinations thereof charge-transporting molecular glass mixtures, luminescent molecular glass mixtures, or combinations thereof for organic light emitting diodes and other organic electronics and photonics applications and method of making same MOLECULAR GLASSES, INC. (US) 2019-10-29 US disclosed
US-10211409-B2 Noncrystallizable sensitized layers for OLED and OEDs MOLECULAR GLASSES, INC. (US) 2019-02-19 US disclosed
US-20170162795-A1 NONCRYSTALLIZABLE SENSITIZED LAYERS FOR OLED AND OEDS MOLECULAR GLASSES, INC. (US) 2017-06-08 US disclosed
EP-3083881-A1 MOLECULAR GLASS MIXTURES FOR ORGANIC ELECTRONICS APPLICATIONS Molecular Glasses, Inc. (US) 2016-10-26 EP disclosed
WO-2015117100-A9 NONCRYSTALLIZABLE SENSITIZED LAYERS FOR OLED AND OEDS MOLAIRE CONSULTING LLC (US) 2015-09-11 WO disclosed
WO-2015095859-A1 MOLECULAR GLASS MIXTURES FOR ORGANIC ELECTRONICS APPLICATIONS MOLAIRE CONSULTING LLC (US) 2015-06-25 WO disclosed
US-20150179714-A1 Crosslinkable, /Polymerizable and Combinations Thereof Charge-transporting Molecular Glass Mixtures, Luminescent Molecular Glass Mixtures, or Combinations Thereof for Organic Light Emitting Diodes and other Organic Electronics and Photonics Applications and Mothod of Making Same. Molaire Consulting 2015-06-25 US disclosed
US-7303856-B2 Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer FUJIFILM CORPORATION (JP) 2007-12-04 US disclosed
WO-2005109098-A1 PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS, AND PATTERN FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2005-11-17 WO disclosed
US-5098814-A Integrated circuit chips of laminates of flexible metal strips and photoresists of polyimidesiloxane copolymers EASTMAN KODAK COMPANY (US) 1992-03-24 US disclosed
EP-0215222-B1 OPTICAL RECORDING ELEMENT HAVING A SMOOTHING LAYER EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1991-12-11 EP disclosed
US-4902605-A Photoresist composition comprising cyclohexyleneoxyalkyl acrylates EASTMAN KODAK COMPANY (US) 1990-02-20 US disclosed
EP-0300203-A2 Photoresist composition comprising cyclohexyleneoxyalkyl acrylates EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-01-25 EP disclosed
US-4792517-A METAL STRIP, PHOTORESISTS EASTMAN KODAK COMPANY (US) 1988-12-20 US disclosed
EP-0215222-A2 Optical recording element having a smoothing layer EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-03-25 EP disclosed
EP-0212271-A2 Micro replication process EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-03-04 EP disclosed
US-4619890-A BENZENE OR CYCLOHEXANE ACRYLIC ESTER EASTMAN KODAK COMPANY (US) 1986-10-28 US disclosed
US-4342151-A PHOTOPOLYMERIZING THE NEGATIVE-WORKING RESIST EASTMAN KODAK COMPANY (US) 1982-08-03 US disclosed
US-4247623-A INTEGRATED CIRCUITS EASTMAN KODAK COMPANY (US) 1981-01-27 US disclosed