Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 2/20 | 0.43 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | RXRA | P19793 | 1/20 | 0.42 |
| ▸ | RXRB | P28702 | 1/20 | 0.42 |
| ▸ | LPL | P06858 | 1/20 | 0.41 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | PPARG | P37231 | 1/20 | 0.39 |
| ▸ | PPARA | Q07869 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | APAF1 | O14727 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30596395 | 1.00 | SMN1; SMN2 (0.46) | SMN1; SMN2CYP2C19RAB9ALMNARXRA | |
| SCHEMBL6008345 | 0.86 | SMN1; SMN2 (0.46) | SMN1; SMN2CYP2C19RAB9ALMNARXRA | |
| SCHEMBL6239615 | 0.83 | THRB (0.49) | SMN1; SMN2RAB9ALMNALPLLIPG | |
| SCHEMBL24282428 | 0.82 | SMN1; SMN2 (0.41) | SMN1; SMN2CYP2C19RAB9ALMNARXRA | |
| SCHEMBL2866672 | 0.81 | SMN1; SMN2 (0.44) | SMN1; SMN2CYP2C19RAB9ALMNARXRA | |
| SCHEMBL10880074 | 0.80 | MEN1 (0.33) | KMT2AMEN1 | |
| SCHEMBL1159793 | 0.79 | CA1 (0.48) | SMN1; SMN2LMNAALDH1A1MAPTHPGD | |
| SCHEMBL28355567 | 0.78 | LDHA (0.37) | CYP2C19PPARGPPARA | |
| SCHEMBL163338 | 0.78 | ALDH1A1 (0.53) | SMN1; SMN2LMNALPLLIPGALDH1A1 | |
| SCHEMBL8389216 | 0.77 | NQO1 (0.64) | LMNAALDH1A1MAPTKMT2ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4190769-A1 | APPLICATION OF POLYDENTATE PHOSPHITE LIGAND IN CATALYTIC SYNTHESIS OF ADIPONITRILE | Zhejiang University (CN) | 2023-06-07 | — | — | EP | disclosed |
| CN-115443181-A | Filter material and mask having antimicrobial or antiviral properties | 奥升德功能材料运营有限公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-115209738-A | Antiviral article | 奥升德功能材料运营有限公司 | 2022-10-18 | — | — | CN | disclosed |
| CN-115190923-A | Antiviral/antimicrobial polymer compositions, fibers and products | 奥升德功能材料运营有限公司 | 2022-10-14 | — | — | CN | disclosed |
| CN-114253069-A | Photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film | 信越化学工业株式会社 | 2022-03-29 | — | — | CN | disclosed |
| CN-114063387-A | Negative photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film | 信越化学工业株式会社 | 2022-02-18 | — | — | CN | disclosed |
| CN-114063388-A | Positive photosensitive resin composition, positive photosensitive dry film, method for producing the same, and method for forming pattern | 信越化学工业株式会社 | 2022-02-18 | — | — | CN | disclosed |
| CN-105189653-B | Polycarbonate resin composition and molded article | 出光兴产株式会社 | 2019-08-30 | — | — | CN | disclosed |
| CN-106795431-B | Heat stabilizer composition and the compound resin composition for using it | 株式会社ADEKA | 2019-05-07 | — | — | CN | disclosed |
| CN-106795431-A | Heat stabilizer composition and use its compound resin composition | 株式会社ADEKA | 2017-05-31 | — | — | CN | disclosed |
| CN-1175047-C | Aromatic polycarbonate composition | ������������ʽ���� | 2004-11-10 | — | — | CN | disclosed |
| CN-1388811-A | Process for preparation of moltem mixtures of aromatic hydroxyl compounds and carbonic diesters | TEIJIN LTD (JP) | 2003-01-01 | — | — | CN | disclosed |
| CN-1351632-A | Aromatic polycarbonate composition | TEIJIN LTD (JP) | 2002-05-29 | — | — | CN | disclosed |
| CN-1319123-A | Polycarbonate resin composition, optical recording medium, and substrate therefor | TEIJIN LTD (JP) | 2001-10-24 | — | — | CN | disclosed |
| US-6303053-B1 | POLYMERIZING AN ANILINE IN WATER OR AN ORGANIC SOLVENT SELECTED FROM N-METHYL-2-PYRROLIDONE, N,N-DIMETHYL SULFOXIDE, N,N-DIMETHYLACETAMIDE AND N,N-DIMETHYLFORMAMIDE, IN THE PRESENCE OF AT LEAST ONE OXIDIZING AGENT | HONDA GIKEN KOGYO KABUSHIKI KAISHA (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-1085034-A1 | Proton conducting polymer, method for producing the same, solid polymer electrolyte and electrode | Honda Giken Kogyo Kabushiki Kaisha (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-0487343-B1 | Process for preparing a lithographic plate | FUJI PHOTO FILM CO LTD (JP) | 1999-04-28 | — | — | EP | disclosed |
| CN-1130646-A | Preparation method of polycarbonate resin | GEN ELECTRIC (US) | 1996-09-11 | — | — | CN | disclosed |
| EP-0487343-A1 | Process for preparing a lithographic plate | Fuji Photo Film Co., Ltd. (JP) | 1992-05-27 | — | — | EP | disclosed |
| US-4569948-A | CATALYTIC REACTION OF CARBON MONOXIDE AND HYDROGEN GASES | AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1986-02-11 | — | — | US | disclosed |