Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23509950 | 0.87 | POLB (0.39) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL16372900 | 0.85 | MAPK1 (0.41) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL18793086 | 0.84 | POLB (0.45) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL14523973 | 0.83 | POLB (0.46) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL70883 | 0.80 | MAPK1 (0.49) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL19012506 | 0.80 | MAPK1 (0.49) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL25358238 | 0.80 | POLB (0.46) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL15246711 | 0.79 | MAPK1 (0.41) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL27047573 | 0.79 | POLB (0.44) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 | |
| SCHEMBL5530696 | 0.78 | ALDH1A1 (0.42) | POLBKDM4ESMN1; SMN2ALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9395625-B2 | Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2016-07-19 | — | — | US | disclosed |
| US-9395625-B2 | Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2016-07-19 | — | — | US | disclosed |
| US-9104105-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-9104105-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-20150037733-A1 | ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| US-20150037733-A1 | ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2015-02-05 | — | — | US | disclosed |
| EP-2821403-A1 | ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION | Kuraray Co., Ltd. (JP) | 2015-01-07 | — | — | EP | disclosed |
| US-8846295-B2 | Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-09-30 | — | — | US | disclosed |
| US-8846295-B2 | Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-09-30 | — | — | US | disclosed |
| US-20140242518-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-28 | — | — | US | disclosed |
| US-20080038676-A1 | TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-14 | — | — | US | disclosed |
| WO-2007121456-A2 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-10-25 | — | — | WO | disclosed |
| US-20070243484-A1 | Wet developable bottom antireflective coating composition and method for use thereof | GLOBALFOUNDRIES U.S. INC. | 2007-10-18 | — | — | US | disclosed |
| US-20070243484-A1 | Wet developable bottom antireflective coating composition and method for use thereof | GLOBALFOUNDRIES U.S. INC. | 2007-10-18 | — | — | US | disclosed |
| US-20070231736-A1 | Bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2007-10-04 | — | — | US | disclosed |
| US-20070231736-A1 | Bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2007-10-04 | — | — | US | disclosed |
| US-20070083021-A1 | Fluorocopolymer, method for its production and resist composition containing it | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-04-12 | — | — | US | disclosed |
| US-20070083021-A1 | Fluorocopolymer, method for its production and resist composition containing it | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-04-12 | — | — | US | disclosed |
| US-20060058480-A1 | Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | AFF1, AFF2, FPR1 | POLB 2358/4885KDM4E 2078/4885SMN1; SMN2 3124/4885 |
| US-20150037733-A1 | ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION | GFER, ASH2L, MLLT1 | POLB 2592/4885KDM4E 991/4885SMN1; SMN2 4381/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.