Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.73 |
| ▸ | CA1 | P00915 | 2/20 | 0.73 |
| ▸ | CA12 | O43570 | 1/20 | 0.73 |
| ▸ | CA3 | P07451 | 1/20 | 0.73 |
| ▸ | TYR | P14679 | 1/20 | 0.73 |
| ▸ | DRD1 | P21728 | 1/20 | 0.73 |
| ▸ | CA4 | P22748 | 1/20 | 0.73 |
| ▸ | CA6 | P23280 | 1/20 | 0.73 |
| ▸ | CA5A | P35218 | 1/20 | 0.73 |
| ▸ | CA7 | P43166 | 1/20 | 0.73 |
| ▸ | CA9 | Q16790 | 1/20 | 0.73 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.73 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.73 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.64 |
| ▸ | TSHR | P16473 | 3/20 | 0.55 |
| ▸ | TP53 | P04637 | 1/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | GAA | P10253 | 1/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL900831 | 0.91 | TSHR (0.67) | CA2CA1CA12CA3TYR | |
| SCHEMBL17942904 | 0.90 | ALDH1A1 (0.63) | CA2CA1CA12CA3TYR | |
| Paraben SCHEMBL4110 | 0.85 | CA2 (1.00) | CA2CA1CA12CA3TYR | |
| Terephthalic Acid SCHEMBL6692916 | 0.85 | CA2 (1.00) | CA2CA1CA12CA3TYR | |
| Paraben SCHEMBL3212865 | 0.85 | CA2 (1.00) | CA2CA1CA12CA3TYR | |
| Paraben SCHEMBL5311518 | 0.85 | CA2 (1.00) | CA2CA1CA12CA3TYR | |
| Terephthalic Acid SCHEMBL3460105 | 0.85 | CA2 (1.00) | CA2CA1CA12CA3TYR | |
| Paraben SCHEMBL7622776 | 0.85 | CA2 (1.00) | CA2CA1CA12CA3TYR | |
| Paraben SCHEMBL20500516 | 0.85 | CA2 (1.00) | CA2CA1CA12CA3TYR | |
| SCHEMBL1552114 | 0.84 | HDAC1 (0.64) | CA2CA1CA12CA3TYR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114292564-A | CaCO (calcium carbonate)3Grafted polyether sulfone modified epoxy resin composite material and preparation method thereof | 陈宝山 | 2022-04-08 | — | — | CN | claimed |
| CN-112546883-B | Polyelectrolyte, preparation and application thereof, polyelectrolyte ultrafiltration membrane, preparation and application thereof | 吉林大学 | 2022-02-15 | — | — | CN | claimed |
| CN-112546883-A | Polyelectrolyte, preparation and application thereof, polyelectrolyte ultrafiltration membrane, preparation and application thereof | 吉林大学 | 2021-03-26 | — | — | CN | claimed |
| CN-111635526-B | Polyether imide polymer containing carboxyl side group and preparation method and application thereof | 吉林大学 | 2021-03-23 | — | — | CN | claimed |
| CN-111635526-A | Polyether imide polymer containing carboxyl side group and preparation method and application thereof | 吉林大学 | 2020-09-08 | — | — | CN | claimed |
| CN-114292564-A | CaCO (calcium carbonate)3Grafted polyether sulfone modified epoxy resin composite material and preparation method thereof | 陈宝山 | 2022-04-08 | — | — | CN | disclosed |
| CN-112546883-B | Polyelectrolyte, preparation and application thereof, polyelectrolyte ultrafiltration membrane, preparation and application thereof | 吉林大学 | 2022-02-15 | — | — | CN | disclosed |
| CN-112546883-A | Polyelectrolyte, preparation and application thereof, polyelectrolyte ultrafiltration membrane, preparation and application thereof | 吉林大学 | 2021-03-26 | — | — | CN | disclosed |
| CN-111635526-B | Polyether imide polymer containing carboxyl side group and preparation method and application thereof | 吉林大学 | 2021-03-23 | — | — | CN | disclosed |
| CN-111635526-A | Polyether imide polymer containing carboxyl side group and preparation method and application thereof | 吉林大学 | 2020-09-08 | — | — | CN | disclosed |
| EP-2957955-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE | SHINETSU CHEMICAL CO (JP) | 2018-06-06 | — | — | EP | disclosed |
| US-9557645-B2 | Positive photosensitive resin composition, photo-curable dry film and method for producing same, layered product, patterning process, and substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-31 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| EP-2842984-A1 | Polymer compound, chemically amplified negative resist composition, photo-curable dry film and production method thereof, layered product, patterning process, and substrate | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-03-04 | — | — | EP | disclosed |
| US-20150056545-A1 | POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND PRODUCTION METHOD THEREOF, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-26 | — | — | US | disclosed |
| US-20150056545-A1 | POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND PRODUCTION METHOD THEREOF, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-26 | — | — | US | disclosed |
| US-8173349-B2 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-8173349-B2 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20100080963-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20100080963-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |