SCHEMBL5518679

SCHEMBL5518679

O=C(c1ccc(Cl)cc1)c1ccc2cc(C(=O)c3ccc(Cl)cc3)ccc2c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 3/20 0.61
MAPK1 P28482 1/20 0.61
HPGD P15428 1/20 0.59
KMT2A Q03164 3/20 0.55
MEN1 O00255 2/20 0.55
NPC1 O15118 2/20 0.55
RAB9A P51151 2/20 0.55
CES2 O00748 1/20 0.52
CES1 P23141 1/20 0.52
CNR2 P34972 2/20 0.52
CNR1 P21554 1/20 0.52
ALOX15 P16050 1/20 0.50
TSHR P16473 1/20 0.50
CLK1 P49759 1/20 0.50
DYRK1A Q13627 1/20 0.50
DYRK1B Q9Y463 1/20 0.50
HSD17B14 Q9BPX1 1/20 0.50
ELANE P08246 1/20 0.50
FABP2 P12104 1/20 0.49
PPARG P37231 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8967726 0.96 SRD5A2 (0.57) SRD5A2MAPK1HPGDKMT2AMEN1
SCHEMBL9475353 0.93 SRD5A2 (0.59) SRD5A2MAPK1HPGDKMT2AMEN1
SCHEMBL9625609 0.92 HSD17B14 (0.62) SRD5A2MAPK1HPGDKMT2AMEN1
SCHEMBL51827 0.85 SRD5A2 (0.80) SRD5A2MAPK1HPGDCES2CES1
SCHEMBL1681512 0.85 SRD5A2 (0.80) SRD5A2MAPK1HPGDCES2CES1
SCHEMBL9065412 0.85 SRD5A2 (0.80) SRD5A2MAPK1HPGDCES2CES1
SCHEMBL10697158 0.85 SRD5A2 (0.80) SRD5A2MAPK1HPGDCES2CES1
SCHEMBL12274592 0.83 SRD5A2 (0.70) SRD5A2MAPK1HPGDKMT2ANPC1
Hydrochloric Acid SCHEMBL11704986 0.83 SRD5A2 (0.76) SRD5A2MAPK1HPGDCES2CES1
SCHEMBL29985694 0.83 SRD5A2 (0.76) SRD5A2MAPK1HPGDCES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
EP-0431612-B1 Purification of halogenated aromatic sulfones or ketones PHILLIPS PETROLEUM CO (US) 1994-09-28 EP disclosed
US-5260489-A Purification of halogenated aromatic sulfones or ketones PHILLIPS PETROLEUM COMPANY (US) 1993-11-09 US disclosed
US-5191056-A Molding materials TEIJIN LIMITED (JP) 1993-03-02 US disclosed
EP-0431612-A1 Purification of halogenated aromatic sulfones or ketones PHILLIPS PETROLEUM COMPANY (US) 1991-06-12 EP disclosed
US-4990678-A Heating above the boiling point of an added solvent to form a solution; cooling to recrystallize PHILLIPS PETROLEUM COMPANY (US) 1991-02-05 US disclosed