SCHEMBL5521699

SCHEMBL5521699

C=C(C)C(=O)OCOCCOCOC(=O)C(=C)C

nearest known ligand 0.63

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.63
TSHR P16473 7/20 0.50
ALDH1A1 P00352 7/20 0.44
TDP1 Q9NUW8 2/20 0.38
POLB P06746 1/20 0.38
APEX1 P27695 1/20 0.38
HTT P42858 1/20 0.38
TP53 P04637 2/20 0.33
HIF1A Q16665 2/20 0.33
HSD17B10 Q99714 1/20 0.33
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2120181 0.92 THRB (0.55) THRBTSHRALDH1A1TDP1POLB
SCHEMBL1393169 0.92 THRB (0.78) THRBTSHRALDH1A1TDP1POLB
SCHEMBL11965992 0.91 TSHR (0.57) THRBTSHRALDH1A1TDP1POLB
SCHEMBL13302398 0.91 THRB (0.53) THRBTSHRALDH1A1TDP1POLB
SCHEMBL16346281 0.90 THRB (0.56) THRBTSHRALDH1A1TDP1POLB
SCHEMBL704711 0.90 THRB (0.53) THRBTSHRALDH1A1TDP1POLB
SCHEMBL1902057 0.89 THRB (0.57) THRBTSHRALDH1A1TDP1POLB
SCHEMBL1218198 0.89 THRB (0.52) THRBTSHRALDH1A1TDP1POLB
SCHEMBL30241679 0.88 THRB (0.54) THRBTSHRALDH1A1TDP1POLB
SCHEMBL12458545 0.88 THRB (0.54) THRBTSHRALDH1A1TDP1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8741538-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2014-06-03 US disclosed
US-8741538-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2014-06-03 US disclosed
EP-1736485-B1 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN TOKYO OHKA KOGYO CO LTD (JP) 2013-07-31 EP disclosed
US-8178639-B2 Polymer for forming organic anti-reflective coating layer DONGJIN SEMICHEM CO., LTD. (KR) 2012-05-15 US disclosed
US-8178639-B2 Polymer for forming organic anti-reflective coating layer DONGJIN SEMICHEM CO., LTD. (KR) 2012-05-15 US disclosed
US-20100266967-A1 POLYMER FOR FORMING ORGANIC ANTI-REFLECTIVE COATING LAYER DONGJIN SEMICHEM CO., LTD (KR) 2010-10-21 US disclosed
US-20100266967-A1 POLYMER FOR FORMING ORGANIC ANTI-REFLECTIVE COATING LAYER DONGJIN SEMICHEM CO., LTD (KR) 2010-10-21 US disclosed
US-20100151383-A1 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2010-06-17 US disclosed
US-20100151383-A1 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2010-06-17 US disclosed
US-7700259-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 US disclosed
US-7700259-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 US disclosed
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 US disclosed
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern ADH1A, ADH1C, POLR1A THRB 4287/4885TSHR 4198/4885ALDH1A1 56/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.