Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Potassium SCHEMBL29924298 | 0.98 | ALDH1A1 (0.36) | ALDH1A1TSHRTDP1 | |
| SCHEMBL1931927 | 0.82 | GAA (0.36) | GAA | |
| SCHEMBL620517 | 0.82 | GAA (0.42) | ALDH1A1TSHRTDP1GAA | |
| SCHEMBL142215 | 0.82 | TSHR (0.39) | ALDH1A1TSHRTDP1GAA | |
| SCHEMBL2380925 | 0.82 | ALDH1A1 (0.39) | ALDH1A1TSHRTDP1GAA | |
| SCHEMBL12083658 | 0.81 | ALDH1A1 (0.35) | ALDH1A1TSHRTDP1GAA | |
| SCHEMBL5524337 | 0.80 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1GAA | |
| Ethane SCHEMBL28422864 | 0.80 | ALDH1A1 (0.38) | ALDH1A1TSHRTDP1GAA | |
| SCHEMBL1258085 | 0.78 | ALDH1A1 (0.36) | ALDH1A1TSHRTDP1 | |
| SCHEMBL4863036 | 0.78 | ALDH1A1 (0.46) | ALDH1A1TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230129965-A1 | HYDROPHILIC AND OLEOPHOBIC POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| EP-1059563-B1 | Agent for reducing substrate dependence of resist | WAKO PURE CHEM IND LTD (JP) | 2006-08-09 | — | — | EP | disclosed |
| US-6586152-B1 | Useful as an ingredient of a resist composition used for preparation of semiconductor devices and the like, which comprises a compound shown by the following general formula useful as an ingredient of a resist composition used for | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2003-07-01 | — | — | US | disclosed |
| EP-1059563-A1 | Agent for reducing substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |