SCHEMBL2380925

SCHEMBL2380925

CCC(=O)OC(C)(C)CC

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.39
TDP1 Q9NUW8 3/20 0.39
TSHR P16473 1/20 0.39
NAAA Q02083 1/20 0.33
FFAR3 O14843 1/20 0.32
GAA P10253 2/20 0.31
MGAM O43451 1/20 0.31
SI P14410 1/20 0.31
MGAM2 Q2M2H8 1/20 0.31
SOAT1 P35610 1/20 0.31
CYP1A2 P05177 1/20 0.30
HPGD P15428 1/20 0.30
CYP2C19 P33261 1/20 0.30
BLM P54132 1/20 0.30
WRN Q14191 1/20 0.30
HIF1A Q16665 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethane SCHEMBL28422864 0.97 ALDH1A1 (0.38) ALDH1A1TDP1TSHRNAAAFFAR3
SCHEMBL119952 0.84 ALDH1A1 (0.36) ALDH1A1TDP1NAAAFFAR3GAA
SCHEMBL4839421 0.84 ALDH1A1 (0.36) ALDH1A1TDP1NAAAFFAR3GAA
SCHEMBL620517 0.84 GAA (0.42) ALDH1A1TDP1TSHRGAAMGAM
SCHEMBL142215 0.84 TSHR (0.39) ALDH1A1TDP1TSHRGAAMGAM
SCHEMBL9635053 0.82 ALDH1A1 (0.35) ALDH1A1TDP1NAAAFFAR3GAA
SCHEMBL5524339 0.82 ALDH1A1 (0.38) ALDH1A1TDP1TSHRGAA
SCHEMBL5524337 0.82 ALDH1A1 (0.38) ALDH1A1TDP1TSHRGAA
SCHEMBL19821997 0.81 CYP1A2 (0.34) ALDH1A1TDP1TSHRCYP1A2CYP2C19
SCHEMBL12873180 0.81 NAAA (0.31) ALDH1A1TDP1TSHRNAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240228739-A1 COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT, AND CURED PRODUCT ADEKA CORPORATION (JP) 2024-07-11 US disclosed
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
CN-117413022-A Composition, method for producing cured product, and cured product 株式会社ADEKA 2024-01-16 CN disclosed
US-11773266-B2 Polymer, molded body, foam, resin composition, and production method for polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-03 US disclosed
US-11681224-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-20 US disclosed
US-11678562-B2 Methods and systems of organic semiconducting polymers PHILLIPS 66 COMPANY (US) 2023-06-13 US disclosed
US-11640114-B2 Compound, resin, photoresist composition and process for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-02 US disclosed
US-20230129965-A1 HYDROPHILIC AND OLEOPHOBIC POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-04-27 US disclosed
US-11600779-B2 Methods and systems of organic semiconducting polymers PHILLIPS 66 COMPANY (US) 2023-03-07 US disclosed
WO-2022249879-A1 COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT, AND CURED PRODUCT 株式会社ADEKA 2022-12-01 WO disclosed
EP-1747211-A1 PROCESS FOR PREPARING UNSATURATED LACTONES Akzo Nobel N.V. (NL) 2007-01-31 EP disclosed
WO-2005113533-A1 PROCESS FOR PREPARING UNSATURATED LACTONES SYMRISE GMBH & CO. KG (DE) 2005-12-01 WO disclosed
US-6077953-A INTERMEDIATES TO PRODUCE PYRIDAZIN-3-ONE COMPOUNDS WHICH ARE HERBICIDAL COMPOUNDS. SUMITOMO CHEMICAL CO., LTD. (JP) 2000-06-20 US disclosed
EP-0963978-A1 6-Alkoxycarbonylpyridazin-3-one compounds and their use as intermediates in the preparation of pyridazin-3-one herbicides SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-12-15 EP disclosed
EP-0409291-B1 Thermoplastic resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-02-14 EP disclosed
EP-0317262-B1 Transparent resin material JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-01-31 EP disclosed
US-5164469-A Substrate for optical disks, ring opening polymerization of tetracyclododecene derivatives JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-11-17 US disclosed
US-5053471-A Methathesis ring opening polymerization of polar substituted norbornenes or octahydromethanonphthalenes; optics JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-10-01 US disclosed
EP-0409291-A2 Thermoplastic resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-01-23 EP disclosed
EP-0317262-A2 Transparent resin material JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1989-05-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11640114-B2 Compound, resin, photoresist composition and process for producing photoresist pattern HAX1, BRIX1, RXRA ALDH1A1 2800/4885TDP1 2854/4885TSHR 1050/4885
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-0, HCN3, RER1 ALDH1A1 1499/4885TDP1 4514/4885TSHR 1113/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.