SCHEMBL5527337

SCHEMBL5527337

O=C(c1ccc(Cl)cc1)c1ccc(S(=O)(=O)c2ccc(Cl)cc2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 3/20 0.70
ALDH1A1 P00352 2/20 0.70
CYP3A4 P08684 1/20 0.70
SRD5A2 P31213 1/20 0.59
MEN1 O00255 3/20 0.57
KMT2A Q03164 3/20 0.57
PRMT1 Q99873 1/20 0.54
FLT1 P17948 1/20 0.53
FLT4 P35916 1/20 0.53
KDR P35968 1/20 0.53
CA1 P00915 2/20 0.52
CA2 P00918 2/20 0.52
HPGD P15428 2/20 0.52
KDM4E B2RXH2 2/20 0.52
ALOX15 P16050 2/20 0.52
HSD17B10 Q99714 1/20 0.52
SMN1; SMN2 Q16637 2/20 0.51
CES2 O00748 1/20 0.50
CES1 P23141 1/20 0.50
MAOA P21397 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9475034 1.00 MAPK1 (0.70) MAPK1ALDH1A1CYP3A4SRD5A2MEN1
SCHEMBL18022322 0.92 MAPK1 (0.74) MAPK1ALDH1A1CYP3A4SRD5A2MEN1
SCHEMBL10426597 0.91 ALDH1A1 (0.57) MAPK1ALDH1A1CYP3A4SRD5A2MEN1
SCHEMBL15353948 0.91 CES2 (0.58) MAPK1ALDH1A1CYP3A4SRD5A2KMT2A
SCHEMBL17207952 0.89 HPGD (0.56) MAPK1ALDH1A1CYP3A4SRD5A2MEN1
SCHEMBL809347 0.89 HPGD (0.56) MAPK1ALDH1A1CYP3A4SRD5A2MEN1
SCHEMBL12960262 0.89 HPGD (0.56) MAPK1ALDH1A1CYP3A4SRD5A2MEN1
SCHEMBL12960261 0.89 HPGD (0.56) MAPK1ALDH1A1CYP3A4SRD5A2MEN1
SCHEMBL822929 0.89 HPGD (0.56) MAPK1ALDH1A1CYP3A4SRD5A2MEN1
SCHEMBL27670647 0.86 SMN1; SMN2 (0.54) MAPK1ALDH1A1CYP3A4SRD5A2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-8173349-B2 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device FUJIFILM CORPORATION (JP) 2012-05-08 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20100080963-A1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed