SCHEMBL5529613

SCHEMBL5529613

CO[Si](CC=CS(F)(F)(F)(F)F)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL388164 0.78
SCHEMBL388165 0.78
SCHEMBL5533443 0.76 ENPP1 (0.32)
SCHEMBL4592007 0.74
SCHEMBL5529610 0.73 LMNA (0.32)
SCHEMBL23668470 0.73
SCHEMBL23668471 0.73
SCHEMBL5534059 0.72 LMNA (0.32)
SCHEMBL4771759 0.70
SCHEMBL472954 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150368824-A1 WATER AND OIL ULTRA-REPELLENT STRUCTURE AND MANUFACTURING METHOD THEREFOR KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION (KR) 2015-12-24 US disclosed
CN-101063818-A Top coat for lithography processes AIR PROD & CHEM (US) 2007-10-31 CN disclosed
EP-1826613-A2 Top coat for lithography processes Air Products and Chemicals, Inc. (US) 2007-08-29 EP disclosed
US-20070196773-A1 Top coat for lithography processes VERSUM MATERIALS US, LLC 2007-08-23 US disclosed