SCHEMBL5534059

SCHEMBL5534059

CO[Si](CCCCC=CS(F)(F)(F)(F)F)(OC)OC

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5529610 0.94 LMNA (0.32) LMNA
SCHEMBL5533443 0.85 ENPP1 (0.32)
SCHEMBL31351392 0.77 LMNA (0.34) LMNA
SCHEMBL4256481 0.75 LPAR2 (0.43) LMNA
SCHEMBL31572360 0.75 LMNA (0.37) LMNA
SCHEMBL580872 0.75 LMNA (0.33) LMNA
SCHEMBL4256478 0.75 LPAR2 (0.43) LMNA
SCHEMBL1196276 0.73 LMNA (0.32) LMNA
SCHEMBL29029659 0.73 LMNA (0.48) LMNA
SCHEMBL2713411 0.73 LMNA (0.53) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150368824-A1 WATER AND OIL ULTRA-REPELLENT STRUCTURE AND MANUFACTURING METHOD THEREFOR KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION (KR) 2015-12-24 US disclosed
EP-1826613-A2 Top coat for lithography processes Air Products and Chemicals, Inc. (US) 2007-08-29 EP disclosed
US-20070196773-A1 Top coat for lithography processes VERSUM MATERIALS US, LLC 2007-08-23 US disclosed