SCHEMBL5533443

SCHEMBL5533443

CO[Si](CCC=CS(F)(F)(F)(F)F)(OC)OC

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ENPP1 P22413 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5529610 0.87 LMNA (0.32)
SCHEMBL5534059 0.85 LMNA (0.32)
SCHEMBL5529613 0.76
SCHEMBL31351452 0.73
SCHEMBL23668464 0.71
SCHEMBL31351387 0.71 LMNA (0.36)
SCHEMBL28422758 0.71 LPAR2 (0.34)
SCHEMBL17918207 0.71
SCHEMBL581008 0.71
SCHEMBL23668463 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150368824-A1 WATER AND OIL ULTRA-REPELLENT STRUCTURE AND MANUFACTURING METHOD THEREFOR KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION (KR) 2015-12-24 US disclosed
EP-1826613-A2 Top coat for lithography processes Air Products and Chemicals, Inc. (US) 2007-08-29 EP disclosed
US-20070196773-A1 Top coat for lithography processes VERSUM MATERIALS US, LLC 2007-08-23 US disclosed